公开(公告)号：SG125238A1

公开(公告)日：2006-09-29

申请号：SG200601220

申请日：2006-02-24

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  KERKHOF VAN DE MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

Abstract: A sensor for use at substrate level in a high-NA lithographic apparatus has a transparent plate covering a sensing element and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：SG108997A1

公开(公告)日：2005-02-28

申请号：SG200404366

申请日：2004-07-22

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：DE60335595D1

公开(公告)日：2011-02-17

申请号：DE60335595

申请日：2003-11-10

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  DERKSEN ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  SENGERS TIMOTHEUS FRANCISCUS

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

公开(公告)号：DE602005012916D1

公开(公告)日：2009-04-09

申请号：DE602005012916

申请日：2005-12-05

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN DE KERKHOF MARCUS ADRIANUS

IPC: G03F7/20

Abstract: An analyser plate (AP) between a projection system (PL) and a radiation sensor (DS) is illuminated by a beam of projection radiation. The analyser plate contains 2 crossing regions, each of which transmits radiation with a different polarisation direction. The beam of projection radiation is patterned without influencing the polarisation of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor (DS) is given polarisation selectivity.

公开(公告)号：DE602006000357T2

公开(公告)日：2008-12-11

申请号：DE602006000357

申请日：2006-02-17

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANN ,  HARZENDORF TORSTEN

IPC: G03F7/20

Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：SG129369A1

公开(公告)日：2007-02-26

申请号：SG200604590

申请日：2006-07-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  BLEEKER ARNO JAN ,  MULDER HEINE MELLE ,  NOORDMAN OSCAR FRANCISCUS JOSZ ,  SENGERS TIMOTHEUS FRANCISCUS ,  JORRITSMA LAURENTIUS CATRINUS ,  TRENTELMAN MARK ,  STREUTKER GERRIT

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

公开(公告)号：DE602004032091D1

公开(公告)日：2011-05-19

申请号：DE602004032091

申请日：2004-07-12

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG133552A1

公开(公告)日：2007-07-30

申请号：SG2006088587

申请日：2006-12-19

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK ROELOF ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DEN SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

公开(公告)号：SG123712A1

公开(公告)日：2006-07-26

申请号：SG200508042

申请日：2005-12-13

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  KERKHOF VAN DE MARCUS ADRIANUS

Abstract: An analyser plate (AP) between a projection system (PL) and a radiation sensor (DS) is illuminated by a beam of projection radiation. The analyser plate contains 2 crossing regions, each of which transmits radiation with a different polarisation direction. The beam of projection radiation is patterned without influencing the polarisation of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor (DS) is given polarisation selectivity.

公开(公告)号：SG109608A1

公开(公告)日：2005-03-30

申请号：SG200405048

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  VAN WEERT KEES

IPC: G01B15/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.