公开(公告)号：NL2005545A

公开(公告)日：2011-05-18

申请号：NL2005545

申请日：2010-10-18

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  LOOPSTRA ERIK

IPC: G01D5/38 ,  G03F7/20

公开(公告)号：NL2006550A

公开(公告)日：2011-05-17

申请号：NL2006550

申请日：2011-04-06

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  BUURMAN ERIK ,  STAMM UWE

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005114A

公开(公告)日：2011-02-15

申请号：NL2005114

申请日：2010-07-20

Applicant: ASML NETHERLANDS BV

Inventor： DIJSSELDONK ANTONIUS ,  LOOPSTRA ERIK

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004978A

公开(公告)日：2010-08-12

申请号：NL2004978

申请日：2010-06-28

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  BUURMAN ERIK ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2003223A

公开(公告)日：2010-03-31

申请号：NL2003223

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BOEIJ WILHELMUS ,  BUTLER HANS ,  JONGH ROBERTUS ,  SCHOOT JAN ,  SENGERS TIMOTHEUS ,  WIJCKMANS MAURICE ,  JANSSEN FRANCISCUS

IPC: G03F7/20

公开(公告)号：NL2011945A

公开(公告)日：2014-07-29

申请号：NL2011945

申请日：2013-12-12

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  WIJST MARC ,  ZAAL KOEN

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

公开(公告)号：NL2011427A

公开(公告)日：2014-04-02

申请号：NL2011427

申请日：2013-09-12

Applicant: ASML NETHERLANDS BV

Inventor： DEKKERS JEROEN ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  HOEKSTRA PETER

IPC: G01D5/26 ,  G03F7/20 ,  G03F9/00

公开(公告)号：NL2011453A

公开(公告)日：2014-03-24

申请号：NL2011453

申请日：2013-09-17

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SCHOOT JAN ,  SENGERS TIMOTHEUS ,  VALENTIN CHRISTIAAN ,  DIJSSELDONK ANTONIUS

IPC: G03F7/20

公开(公告)号：DE102013111801A1

公开(公告)日：2014-03-13

申请号：DE102013111801

申请日：2013-10-25

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： FIGUEREDO STACY ,  LOOPSTRA ERIK ,  SCHNEIDER SONJA ,  HAUF MARKUS ,  BITTNER BORIS ,  WABRA NORBERT ,  SCHNEIDER RICARDA ,  SCHMIDT HOLGER

IPC: G03F7/20 ,  F25B1/00 ,  F25B9/00

Abstract: Ein Kühlsystem für zumindest eine Systemkomponente (24) eines optisches Systems für EUV-Anwendungen weist zumindest einen Kühlkanal (90) und ein Kühlmedium (92) zum Durchleiten durch den zumindest einen Kühlkanal (90), Aufnehmen von Wärme von der zumindest einen Systemkomponente (24) und zum Abführen der Wärme auf. Das Kühlmedium (92) weist ein inertes Gas, beispielsweise Kohlenstoffdioxid, auf.

公开(公告)号：NL2010529A

公开(公告)日：2013-09-30

申请号：NL2010529

申请日：2013-03-27

Applicant: ASML NETHERLANDS BV

Inventor： VEN BASTIAAN ,  BUTLER HANS ,  LOOPSTRA ERIK ,  GROOT ANTONIUS

IPC: G03F7/20