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    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors
    71.
    发明授权
    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors 失效
    用于带电粒子束光学系统的低像差偏转器以及用于制造这种偏转器的方法

    公开(公告)号：US06802986B2

    公开(公告)日：2004-10-12

    申请号：US10197309

    申请日：2002-07-16

    Applicant: Katsushi Nakano

    Inventor： Katsushi Nakano

    IPC: H01B1300

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01F5/003 ,  H01F7/20 ,  H01F7/202 ,  H01F2041/0711 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/3174 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1526 ,  H01J2237/1534 ,  Y10T29/4902

    Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

    Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束（CPB）光学系统的偏转器。 当相对较小的电流通电时，偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的，几乎不受涡流的影响，并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中，使用磁带层压体作为核心。 此外，使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

    Optimized curvilinear variable axis lens doublet for charged particle beam projection system
    72.
    发明授权
    Optimized curvilinear variable axis lens doublet for charged particle beam projection system 失效
    用于带电粒子束投影系统的优化曲线可变轴透镜双峰

    公开(公告)号：US06617585B1

    公开(公告)日：2003-09-09

    申请号：US09577475

    申请日：2000-05-24

    Applicant: Werner Stickel

    Inventor： Werner Stickel

    IPC: H01J3709

    CPC classification number: H01J37/141 ,  H01J9/00 ,  H01J2237/04922 ,  H01J2237/04928 ,  H01J2237/1405 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/31777

    Abstract: This is a method for designing an optimized charged particle beam projection system. Specify lens configuration and first order optics. Calculate lens excitations. Configure the lens system, providing lens field distributions, beam landing angle, and imaging ray/axis cross-over. Provide an input deflector configuration. Solve a linear equation set, and thereby provide a curvilinear axis and associated deflection field distributions. Calculate the third order aberration coefficients yielding a list of up to 54 aberration coefficients. Provide an input of dynamic correctors. Calculate excitations to eliminate quadratic aberrations in deflection. Calculate third and fifth order aberrations, providing image blur and distortion vs. deflection, best focal plane, and depth of focus. Determine whether the current result is better than the previous result. If YES then change the axial location input to the solve linear equation set. If NO, test whether the current result is acceptable. If NO, provide a deflector configuration. If YES, test whether the deflection current is larger. If YES, change the input for the axial location of the deflectors to solve the linear equation set again. If NO then END the process.

    Abstract translation: 这是设计优化的带电粒子束投影系统的方法。 指定镜头配置和一阶光学。 计算镜头激发。 配置镜头系统，提供镜头场分布，光束着陆角度和成像光线/轴交叉。 提供输入偏转器配置。 求解线性方程组，从而提供曲线轴和相关的偏转场分布。 计算三阶像差系数，得到最多54个像差系数的列表。 提供动态校正器的输入。 计算激发以消除偏转中的二次像差。 计算第三和第五阶像差，提供图像模糊和失真与偏转，最佳焦平面和焦深。 确定当前结果是否比以前的结果更好。 如果是，则将轴向位置输入改为求解线性方程组。 如果否，则检查当前结果是否可以接受。 如果否，请提供偏转器配置。 如果是，则检查偏转电流是否较大。 如果是，则更改偏转器的轴向位置的输入，以再次求解线性方程组。 如果否，则END过程。

    Objective Lens and Transmission Electron Microscope
    74.
    发明申请
    Objective Lens and Transmission Electron Microscope 审中-公开

    公开(公告)号：US20180130633A1

    公开(公告)日：2018-05-10

    申请号：US15710091

    申请日：2017-09-20

    Applicant: JEOL Ltd.

    Inventor： Tatsuo Naruse ,  Yuji Kohno

    IPC: H01J37/141

    CPC classification number: H01J37/141 ,  H01J37/26 ,  H01J2237/04922 ,  H01J2237/1405 ,  H01J2237/24564 ,  H01J2237/2802

    Abstract: There is provided an objective lens capable of reducing the effects of magnetic fields on a sample. The objective lens permits observation of the sample at high resolution. The objective lens (100) includes a first electromagnetic lens (10) and a second electromagnetic lens (20). The first and second lenses (10, 20) produce their respective magnetic fields including components lying along an optical axis (L), and are so arranged that the component of the magnetic field of the first lens (10) lying along the optical axis (L) and the component of the magnetic field of the second lens (20) lying along the optical axis (L) cancel out each other at a sample placement surface (2). The first lens (10) includes an inner polepiece (15) and an outer polepiece (16). Similarly, the second lens (20) includes an inner polepiece (25) and an outer polepiece (26). The inner polepieces (15, 25) have front end portions (15a, 25a), respectively. The outer polepieces (16, 26) have front end portions (16a, 26a), respectively, which jut out toward the optical axis (L). The distances (D2, D4) of the front end portions (16a, 26a) of the outer polepieces (16, 26), respectively, from the sample placement surface (2) are less than the distances (D1, D3) of the front end portions (15a, 25a) of the inner polepieces (15, 25), respectively, from the sample placement surface (2).

    Notched magnetic lens for improved sample access in an SEM
    77.
    发明授权
    Notched magnetic lens for improved sample access in an SEM 有权
    用于在SEM中改善样品存取的缺口磁性透镜

    公开(公告)号：US09443693B2

    公开(公告)日：2016-09-13

    申请号：US14738632

    申请日：2015-06-12

    Applicant: KLA-Tencor Corporation

    Inventor： Christopher M. Sears

    IPC: H01J37/141 ,  H01J37/28

    CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/1415 ,  H01J2237/2807

    Abstract: A magnetic immersion lens apparatus includes an outer pole piece and an inner pole piece with a gap therebetween. The outer pole piece has an opening that permits energetic particles from a target in front of the immersion lens to pass through the outer pole piece to an external detector. The outer or inner pole piece has one or more notches near the gap. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

    Abstract translation: 磁浸透镜装置包括外极片和内极片之间的间隙。 外极片具有允许来自浸没透镜前方的目标物的高能粒子通过外极片的外部检测器的开口。 外部或内部极片在间隙附近具有一个或多个凹口。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

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