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    LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF AN STAGE OF A LITHOGRAPHIC APPARATUS.
    112.
    发明专利
    LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF AN STAGE OF A LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2006057A

    公开(公告)日：2011-08-25

    申请号：NL2006057

    申请日：2011-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

    ACTIVE MOUNT, LITHOGRAPHIC APPARATUS COMPRISING SUCH ACTIVE MOUNT AND METHOD FOR TUNING SUCH ACTIVE MOUNT.
    113.
    发明专利
    ACTIVE MOUNT, LITHOGRAPHIC APPARATUS COMPRISING SUCH ACTIVE MOUNT AND METHOD FOR TUNING SUCH ACTIVE MOUNT. 未知

    公开(公告)号：NL2005701A

    公开(公告)日：2011-06-23

    申请号：NL2005701

    申请日：2010-11-16

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  MEIJERS PIETER ,  SCHELLENS HENDRIKUS

    IPC: H01L21/683 ,  G03F7/20

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system is mounted on a reference structure of the lithographic apparatus by a mount of the lithographic apparatus. The mount includes a first piezoelectric element to exert a force on the projection system, a second piezoelectric element to measure the force, and an interconnection member interposed between the first and second piezoelectric elements, the interconnection member comprising a cut.

    117.
    发明专利
    未知

    公开(公告)号：DE60214792D1

    公开(公告)日：2006-11-02

    申请号：DE60214792

    申请日：2002-06-13

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS

    IPC: G03F7/20 ,  H01L21/027 ,  H02P5/00

    Abstract: A lithographic projection apparatus includes a first object table configured and arranged to hold a patterning structure capable of patterning a projection beam of radiation according to a desired pattern and a second object table configured and arranged to hold a substrate. A positioning structure is configured and arranged to generate a force so as to move one of the object tables with respect to a projection system during an imaging operation. Processing circuitry is configured and arranged to read from a data storage device a compensation force value that corresponds to a value of a signal representing a position of said object table and to generate a force adjustment signal based on the compensation force value. The positioning structure is further configured and arranged to generate the force according to the force adjustment signal.

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