公开(公告)号：NL2008833A

公开(公告)日：2012-12-28

申请号：NL2008833

申请日：2012-05-16

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  PASCH ENGELBERTUS ,  VEN BASTIAAN ,  VERMEULEN JOHANNES ,  CADEE THEODORUS ,  LEEUWEN ROBBERT

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2004681A

公开(公告)日：2011-01-10

申请号：NL2004681

申请日：2010-05-06

Applicant: ASML NETHERLANDS BV

Inventor： JEUNINK ANDRE ,  BANINE VADIM ,  BUTLER HANS ,  VERMEULEN JOHANNES ,  KRUIJT-STEGEMAN YVONNE ,  PASCH ENGELBERTUS

IPC: G03F7/00

公开(公告)号：NL2004598A

公开(公告)日：2010-11-30

申请号：NL2004598

申请日：2010-04-23

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  DONDERS SJOERD ,  JACOBS JOHANNES ,  KATE NICOLAAS ,  VERMEULEN JOHANNES ,  ZAAL KOEN ,  REMIE MARTIN

IPC: G03F7/20

公开(公告)号：NL2004266A

公开(公告)日：2010-10-28

申请号：NL2004266

申请日：2010-02-18

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  GILISSEN NOUD ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/68

Abstract: An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face.

公开(公告)号：NL2003347A

公开(公告)日：2010-03-16

申请号：NL2003347

申请日：2009-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  SMITS PASCAL ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  SCHIFFART CATHARINUS

IPC: G03F7/00

Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.

公开(公告)号：NL2012204A

公开(公告)日：2014-12-18

申请号：NL2012204

申请日：2014-02-05

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： DEL PUERTO SANTIAGO ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS ,  VERMEULEN JOHANNES ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  WILK RONALD

IPC: G03F7/20

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：NL2012615A

公开(公告)日：2014-06-10

申请号：NL2012615

申请日：2014-04-14

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  VERMEULEN JOHANNES

IPC: G03F7/20

公开(公告)号：NL2009870A

公开(公告)日：2013-06-26

申请号：NL2009870

申请日：2012-11-23

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2008831A

公开(公告)日：2013-01-02

申请号：NL2008831

申请日：2012-05-16

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  COX HENRIKUS ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2008695A

公开(公告)日：2012-11-27

申请号：NL2008695

申请日：2012-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.