公开(公告)号：NL2010762A

公开(公告)日：2013-12-02

申请号：NL2010762

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  BLOKS RUUD ,  CORTIE ROGIER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES ,  LAFARRE RAYMOND ,  LEMPENS HAN ,  OVERKAMP JIM ,  PIETERSE GERBEN ,  POLET THEODORUS ,  SIMONS WILHELMUS ,  STEFFENS KOEN ,  TROMP SIEGFRIED ,  VY VAN VUONG

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：NL2009870A

公开(公告)日：2013-06-26

申请号：NL2009870

申请日：2012-11-23

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2008831A

公开(公告)日：2013-01-02

申请号：NL2008831

申请日：2012-05-16

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  COX HENRIKUS ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2007802A

公开(公告)日：2012-06-25

申请号：NL2007802

申请日：2011-11-17

Applicant: ASML NETHERLANDS BV

Inventor： KATE NICOLAAS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  H01L21/68

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：NL2006913A

公开(公告)日：2012-01-17

申请号：NL2006913

申请日：2011-06-09

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  KUNNEN JOHAN ,  BADIE RAMIN ,  KUSTERS GERARDUS ,  KNARREN BASTIAAN ,  LAFARRE RAYMOND ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  VOOGD ROBBERT JAN ,  CORCORAN GREGORY ,  BLOKS RUUD

IPC: G03F7/20

公开(公告)号：NL2006203A

公开(公告)日：2011-09-19

申请号：NL2006203

申请日：2011-02-15

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  ROSET NIEK ,  ZDRAVKOV ALEXANDER ,  STOUWDAM JAN ,  BIJL BERNARDUS

IPC: G03F7/20

Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

公开(公告)号：NL2005126A

公开(公告)日：2011-03-22

申请号：NL2005126

申请日：2010-07-22

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS

IPC: G03F7/20

公开(公告)号：NL2005120A

公开(公告)日：2011-03-22

申请号：NL2005120

申请日：2010-07-21

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  CASTELIJNS HENRICUS ,  BOKHOVEN LAURENTIUS

IPC: G03F7/20

Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.