公开(公告)号：NL2010747A

公开(公告)日：2013-11-12

申请号：NL2010747

申请日：2013-05-02

Applicant: ASML NETHERLANDS BV

Inventor： KOEVOETS ADRIANUS ,  CADEE THEODORUS PETRUS MARIA ,  SINGH HARMEET

IPC: G03F7/20

公开(公告)号：NL2009549A

公开(公告)日：2013-05-07

申请号：NL2009549

申请日：2012-10-01

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  SEGERS HUBERT MARIE ,  CADEE THEODORUS PETRUS MARIA ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.

公开(公告)号：SG123783A1

公开(公告)日：2006-07-26

申请号：SG200508422

申请日：2005-10-27

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA

公开(公告)号：NL2010679A

公开(公告)日：2013-11-26

申请号：NL2010679

申请日：2013-04-22

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  CADEE THEODORUS PETRUS MARIA

IPC: G03F7/20

公开(公告)号：NL2010565A

公开(公告)日：2013-10-29

申请号：NL2010565

申请日：2013-04-03

Applicant: ASML NETHERLANDS BV

Inventor： GROOT ANTONIUS FRANCISCUS ,  BROERS SANDER CHRISTIAAN ,  CADEE THEODORUS PETRUS MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HUANG YANG-SHAN ,  BOEIJ JEROEN ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  VEN BASTIAAN LAMBERTUS

IPC: G03F7/20

公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

公开(公告)号：NL2009902A

公开(公告)日：2013-07-01

申请号：NL2009902

申请日：2012-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BLEEKER ARNO ,  HENNUS PIETER ,  HOEKS MARTINUS ,  HOL SVEN ANTOIN JOHAN ,  SCHOOT HARMEN ,  SLAGHEKKE BERNARDUS ,  TINNEMANS PATRICIUS ,  WIJST MARC ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  BEERENS RUUD ,  FISCHER OLOF ,  AANGENENT WOUTER ,  BOSCH NIELS JOHANNES MARIA

IPC: G03F7/20

公开(公告)号：NL2009870A

公开(公告)日：2013-06-26

申请号：NL2009870

申请日：2012-11-23

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND

IPC: G03F7/20