公开(公告)号：NL2009239A

公开(公告)日：2013-03-04

申请号：NL2009239

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BLEEKER ARNO ,  BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20

公开(公告)号：NL2006563A

公开(公告)日：2011-05-17

申请号：NL2006563

申请日：2011-04-07

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  KAMPEN MAARTEN

IPC: G03F7/20

公开(公告)号：NL2003777A

公开(公告)日：2010-07-13

申请号：NL2003777

申请日：2009-11-10

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  BUURMAN ERIK

IPC: G03F7/20 ,  H05G2/00

Abstract: A laser device includes a seed laser, an amplifier, a detector, and an optical element arranged to direct radiation emitted by the seed laser towards a plasma generation site. The optical element is arranged to direct towards the detector amplified spontaneous emission radiation which has been emitted by the seed laser and has been reflected from a droplet of fuel material. The detector is arranged to trigger generation of a laser radiation pulse by the seed laser when the reflected amplified spontaneous emission radiation is detected.

公开(公告)号：NL2003310A1

公开(公告)日：2010-02-16

申请号：NL2003310

申请日：2009-07-30

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  MOORS ROEL

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：AU2003290094A1

公开(公告)日：2005-06-08

申请号：AU2003290094

申请日：2003-12-18

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG

Inventor： KWAN YIM-BUN PATRICK ,  LOOPSTRA ERIK

IPC: G02B5/00 ,  G02B13/14 ,  G03F7/20

公开(公告)号：NL2011580A

公开(公告)日：2014-05-08

申请号：NL2011580

申请日：2013-10-10

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  BANINE VADIM ,  NIKIPELOV ANDREY ,  OSORIO OLIVEROS EDGAR ,  STRUYCKEN ALEXANDER ,  DRIE NHUIZEN BERT ,  SCHOOT JAN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG2014007694A

公开(公告)日：2014-03-28

申请号：SG2014007694

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  LOOPSTRA ERIK ,  RENTROP CORNE ,  DE GRAAF DENNIS ,  GUBBELS FRITS ,  HAYES GREGORY RICHARD ,  VAN DE WIEL HUBERTUS JOHANNES

IPC: H05G2/00 ,  B41J2/16 ,  G03F7/20

公开(公告)号：SG184557A1

公开(公告)日：2012-11-29

申请号：SG2012075628

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

公开(公告)号：NL2007863A

公开(公告)日：2011-12-19

申请号：NL2007863

申请日：2011-11-24

Applicant: ASML NETHERLANDS BV

Inventor： WAGNER CHRISTIAN ,  LOOPSTRA ERIK

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005748A

公开(公告)日：2011-01-06

申请号：NL2005748

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  BRULS RICHARD ,  IVANOV VLADIMIR ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H05G2/00