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公开(公告)号：NL2010402A
公开(公告)日：2013-10-01
申请号：NL2010402
申请日：2013-03-06
Applicant: ASML NETHERLANDS BV
Inventor： SINGH HARMEET , BANINE VADIM , FINDERS JOZEF , WUISTER SANDER , KOOLE ROELOF , PEETERS EMIEL
IPC: G03F7/20
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公开(公告)号：SG183434A1
公开(公告)日：2012-09-27
申请号：SG2012062014
申请日：2011-01-31
Applicant: ASML NETHERLANDS BV
Inventor： LABETSKI DZMITRY , BANINE VADIM , LOOPSTRA ERIK , YAKUNIN ANDREI
Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
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公开(公告)号：AT552519T
公开(公告)日：2012-04-15
申请号：AT09715126
申请日：2009-02-24
Applicant: ASML NETHERLANDS BV
Inventor： SOER WOUTER , BANINE VADIM , MOORS JOHANNES , VAN HERPEN MAARTEN , YAKURIN ANDREY
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公开(公告)号：NL2005992A
公开(公告)日：2011-09-23
申请号：NL2005992
申请日：2011-01-12
Applicant: ASML NETHERLANDS BV
Inventor： WUISTER SANDER , BANINE VADIM , BOEF ARIE , KRUIJT-STEGEMAN YVONNE , RAKHIMOVA TATYANA , LOPAEV DMITRIY , GLUSHKOV DENNIS , YAKUNIN ANDREI , KOOLE ROELOF
IPC: G03F7/00
Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
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公开(公告)号：NL2005516A
公开(公告)日：2011-06-21
申请号：NL2005516
申请日：2010-10-14
Applicant: ASML NETHERLANDS BV
Inventor： SCACCABAROZZI LUIGI , BANINE VADIM , IVANOV VLADIMIR , YAKUNIN ANDREI
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Patent Agency Ranking
公开(公告)号：NL2006601A
公开(公告)日：2011-06-09
申请号：NL2006601
申请日：2011-04-14
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , LOOPSTRA ERIK , CADEE THEODORUS , AKKERMANS JOHANNES , SCACCABAROZZI LUIGI
IPC: G03F7/20 , H01L21/687
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公开(公告)号：NL2005118A
公开(公告)日：2011-02-22
申请号：NL2005118
申请日：2010-07-21
Applicant: ASML NETHERLANDS BV
Inventor： SOER WOUTER , BANINE VADIM , HERPEN MAARTEN , YAKUNIN ANDREI , JAK MARTIN
Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.
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公开(公告)号：NL2006106A
公开(公告)日：2011-02-17
申请号：NL2006106
申请日：2011-01-31
Applicant: ASML NETHERLANDS BV
Inventor： LOOPSTRA ERIK , BANINE VADIM , IVANOV VLADIMIR , MOORS JOHANNES , SWINKELS GERARDUS , KEMPEN ANTONIUS , YAKUNIN ANDREI
IPC: G03F7/20
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公开(公告)号：NL2004681A
公开(公告)日：2011-01-10
申请号：NL2004681
申请日：2010-05-06
Applicant: ASML NETHERLANDS BV
Inventor： JEUNINK ANDRE , BANINE VADIM , BUTLER HANS , VERMEULEN JOHANNES , KRUIJT-STEGEMAN YVONNE , PASCH ENGELBERTUS
IPC: G03F7/00
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80.发明专利
公开(公告)号：NL2003405A
公开(公告)日：2010-03-30
申请号：NL2003405
申请日：2009-08-28
Applicant: ASML NETHERLANDS BV
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