公开(公告)号：WO2009147014A1

公开(公告)日：2009-12-10

申请号：PCT/EP2009056130

申请日：2009-05-20

Applicant: ASML NETHERLANDS BV ,  GLUSHKOV DENIS ,  BANINE VADIM ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SJMAENOK LEONID AIZIKOVITCH ,  SALASCHENKO NIKOLAI NIKOLAEVIC

Inventor： GLUSHKOV DENIS ,  BANINE VADIM ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  SJMAENOK LEONID AIZIKOVITCH ,  SALASCHENKO NIKOLAI NIKOLAEVICH

IPC: G03F7/20 ,  G03F1/14 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F1/24 ,  G21K1/062 ,  G21K2201/067

Abstract: A multilayer mirror is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers U and B9C layers, Th and B9C layers, La and B layers, C and B layers, U and B layers, and Th and B layers.

Abstract translation: 构造并布置多层反射镜以反射波长在2-8nm范围内的辐射。 多层反射镜具有选自Cr和Sc层，Cr和C层，C和B4C层，U和B4C层，Th和B4C层，C和B9C层，La和B9C层U和B9C的交替层 层，Th和B9C层，La和B层，C和B层，U和B层，以及Th和B层。

公开(公告)号：NL2011306A

公开(公告)日：2014-03-12

申请号：NL2011306

申请日：2013-08-15

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  WAGNER CHRISTIAN ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2011237A

公开(公告)日：2014-02-04

申请号：NL2011237

申请日：2013-07-30

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  MINNAERT ARTHUR ,  MUITJENS MARCEL ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI ,  MALLMANN HANS ,  BAL KURSAT ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG ,  HUIJBERTS ALEXANDER ,  GASSELING PAULUS ,  RIZO DIAGO PEDRO ,  KAMPEN MAARTEN ,  AERLE NICK

IPC: G03F7/20

公开(公告)号：NL2009352A

公开(公告)日：2013-03-25

申请号：NL2009352

申请日：2012-08-23

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BANINE VADIM ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS ,  MOORS JOHANNES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  SWINKELS GERARDUS ,  STAMM UWE ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010232A

公开(公告)日：2013-03-19

申请号：NL2010232

申请日：2013-02-01

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BANINE VADIM ,  IVANOV VLADIMIR ,  DIJKSMAN JOHAN ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：AT544096T

公开(公告)日：2012-02-15

申请号：AT09169802

申请日：2009-09-09

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  BANINE VADIM ,  LOOPSTRA ERIK

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma (12) generating EUV radiation. A mirrored collector (10) collects and reflects the EUV radiation generated at a first focus towards a second focus (F2). A contamination barrier (20) is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime. Gas extraction ports may be provided near the plasma formation site to suppress diffusion of fuel debris and contamination towards the collector mirror.

公开(公告)号：NL2005463A

公开(公告)日：2011-06-20

申请号：NL2005463

申请日：2010-10-06

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G01N21/94

Abstract: A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs. Thus by detecting the thermal radiation, it is possible to detect the presence of particles deposited on the mask. If particles are detected, the mask can be cleaned.

公开(公告)号：NL2006604A

公开(公告)日：2011-06-09

申请号：NL2006604

申请日：2011-04-14

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BOEIJ WILHELMUS ,  DIJSSELDONK ANTONIUS ,  LOOPSTRA ERIK ,  MOORS ROEL ,  SCHOOT JAN ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G21K1/06

公开(公告)号：NL2005392A

公开(公告)日：2011-03-28

申请号：NL2005392

申请日：2010-09-24

Applicant: ASML NETHERLANDS BV ,  CYMER

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  SWINKELS GERARDUS ,  PEKELDER SVEN ,  LABETSKI DZMITRY ,  STAMM UWE ,  PARTLO WILLIAM N

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005111A

公开(公告)日：2011-02-22

申请号：NL2005111

申请日：2010-07-19

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  BANINE VADIM ,  HERPEN MAARTEN ,  SOER WOUTER ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G21K1/06