公开(公告)号：JP2010278433A

公开(公告)日：2010-12-09

申请号：JP2010115056

申请日：2010-05-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN EIJK JAN ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  ZAAL KOEN JACOBUS J M ,  KATE NICOLAAS TEN ,  REMIE MARINUS JAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70758 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To improve a cooling system for cooling an optical component having an optical component as a part to be cooled. SOLUTION: A lithographic apparatus is configured to transfer a pattern from a patterning device to a substrate. The lithographic apparatus includes a cooling system including a droplet ejector for cooling parts of the lithographic apparatus, forming droplets that are injected to cooling surfaces of the parts of the lithographic apparatus, and cooling the parts through evaporation of the droplets. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：改进用于冷却具有作为待冷却部件的光学部件的光学部件的冷却系统。 解决方案：光刻设备被配置为将图案从图案形成装置传送到基板。 光刻设备包括冷却系统，其包括用于冷却光刻设备的部件的液滴喷射器，形成喷射到光刻设备的部分的冷却表面的液滴，以及通过液滴的蒸发来冷却部件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010135787A

公开(公告)日：2010-06-17

申请号：JP2009268224

申请日：2009-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNAAPEN THIJS EGIDIUS JOHANNES ,  BRULS RICHARD JOSEPH ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KAMPHUIS MARTIJN HENDRIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MAAS RUDOLF ADRIANUS JOANNES ,  STAVENGA MARCO KOERT ,  VERSPAGET COEN CORNELIS WILHELMUS ,  PELLENS RUDY JAN MARIA ,  VAN DER HOEVEN JAN CORNELIS ,  ANSTOTZ DAVID LUCIEN ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  MARCUS JOHANNES VAN DER ZANDEN ,  BADAM VIJAY KUMAR ,  DE GROOT CASPER RODERIK

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少了在曝光基板之后残留在基板台上的液滴的潜在不利影响。 公开了具有包括靶和/或传感器的台的液晶显示装置以及使用局部气流从液体和/或传感器移出液体的液体排量装置。 液体置换装置可以设置在各种位置。 例如，液体移动装置可以安装在曝光站处的液体处理装置上，并且可以设置在靠近曝光站和测量站之间或与装载/卸载站相邻的传送通道或者 传感器在传输通道中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010074187A

公开(公告)日：2010-04-02

申请号：JP2009292141

申请日：2009-12-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a sealing member or barrier member which reduces a turbulent flow and reduces overflowing of an immersion liquid in a liquid supply system used for an immersion lithographic apparatus. SOLUTION: The liquid supply system used for the immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of a projection system and a substrate. A control system minimizes the changes of overflowing and an extractor includes an array of outlets configured to minimizes vibrations. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少湍流并减少用于浸没式光刻设备的液体供应系统中的浸没液体溢出的密封构件或阻挡构件。 解决方案：用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的变化最小化，并且提取器包括被配置为使振动最小化的出口阵列。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010010707A

公开(公告)日：2010-01-14

申请号：JP2009234094

申请日：2009-10-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminate energy loss in a lithographic apparatus where a related component is locally cooled by evaporation of a supplied liquid and may be deformed and change in quality to possibly cause defocusing and lens aberrations during immersion lithography in which the part between a projection system and a substrate is filled with an immersion liquid so as to increase a numerical aperture. SOLUTION: A schedule table 34 is prepared which contains information regarding time when the supplied liquid 11 is most apt to evaporate, the position, speed, acceleration, etc. of the substrate, and a liquid evaporation controller 30 heats at least part of the substrate W by a heater or sends humidifying air according to the schedule table 34 to prevent local evaporation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的能量损失，其中相关部​​件通过供应液体的蒸发局部冷却，并且可能变形并且质量变化以可能引起散焦和透镜 浸渍光刻期间的像差，其中投影系统和衬底之间的部分被浸没液体填充以增加数值孔径。 解决方案：准备一个计划表34，其中包含关于所供应的液体11最易蒸发的时间的信息，基板的位置，速度，加速度等，并且液体蒸发控制器30加热至少部分 或者根据附表表34发送加湿空气以防止局部蒸发。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010004037A

公开(公告)日：2010-01-07

申请号：JP2009137821

申请日：2009-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AXEL SEBASTIAAN LEXMOND ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LEONARD FERDINAND GERARD GEERS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography apparatus comprising a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. SOLUTION: The substrate table supports a substrate. The projection system induces a patterned radiation beam to a target portion of the substrate. The liquid confinement structure confines immersion liquid at least partially to a space between the projection system and the substrate and/or substrate table, or between the both of them. The thermal measurement system includes thermosensitive coating. The thermal measurement system 100 detects a temperature of the immersion liquid contacting the coating. The thermal measurement system, metrology system having the thermal measurement system, and a dummy wafer for the thermal measurement system are also disclosed. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括基板台，投影系统，液体限制结构和热测量系统的光刻设备。

解决方案：衬底台支撑衬底。 投影系统将图案化的辐射束引导到基板的目标部分。 液体限制结构将浸没液体至少部分地限制在投影系统与衬底和/或衬底台之间或两者之间的空间。 热测量系统包括热敏涂层。 热测量系统100检测与涂层接触的浸液的温度。 还公开了具有热测量系统的热测量系统，测量系统和用于热测量系统的虚拟晶片。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)

公开(公告)号：NL2008272A

公开(公告)日：2012-09-11

申请号：NL2008272

申请日：2012-02-10

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：SG171646A1

公开(公告)日：2011-06-29

申请号：SG2011031127

申请日：2006-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]

公开(公告)号：SG145770A1

公开(公告)日：2008-09-29

申请号：SG2008062531

申请日：2006-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

公开(公告)号：SG174691A1

公开(公告)日：2011-10-28

申请号：SG2011017159

申请日：2011-03-09

Applicant: ASML NETHERLANDS BV

Inventor： NICOLAAS TEN KATE ,  JOOST JEROEN OTTENS ,  BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN ,  ROBBERT JAN VOOGD ,  GIOVANNI FRANCISCO NINO ,  MARINUS JAN REMIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

Abstract: Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]