公开(公告)号：SG176490A1

公开(公告)日：2011-12-29

申请号：SG2011084712

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  TIJMEN WILFRED MATHIJS GUNTHER ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.Fig. 12b

公开(公告)号：SG128649A1

公开(公告)日：2007-01-30

申请号：SG200604387

申请日：2006-06-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  SHULEPOV SERGEI

公开(公告)号：SG120267A1

公开(公告)日：2006-03-28

申请号：SG200505158

申请日：2005-08-12

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  TEUNISSE FRANCISCUS JOHANNES H ,  VAN DER TOORN JAN-GERARD CORNE ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA

公开(公告)号：CA3003766A1

公开(公告)日：2017-05-11

申请号：CA3003766

申请日：2016-11-03

Applicant: ASML NETHERLANDS BV

Inventor： DE JAGER PIETER WILLEM HERMAN ,  BIJLSMA SIPKE JACOB ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  NIKIPELOV ANDREY ALEXANDROVICH ,  TEN KATE NICOLAAS ,  DERKSEN ANTONIUS THEODORUS ANNA MARIA ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  LANSBERGEN ROBERT GABRIEL MARIA ,  KASTELIJN AUKJE ARIANNE ANNETTE

IPC: G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：NL2007768A

公开(公告)日：2012-06-18

申请号：NL2007768

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：SG171645A1

公开(公告)日：2011-06-29

申请号：SG2011031119

申请日：2006-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]

公开(公告)号：DE602006019478D1

公开(公告)日：2011-02-17

申请号：DE602006019478

申请日：2006-11-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ,  SMEULERS JOHANNES PETRUS ,  BECKERS MARCEL ,  SHULEPOV SERGEL ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE602006012746D1

公开(公告)日：2010-04-22

申请号：DE602006012746

申请日：2006-01-11

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

IPC: G03F7/20

公开(公告)号：SG159467A1

公开(公告)日：2010-03-30

申请号：SG2009054792

申请日：2009-08-17

Applicant: ASML NETHERLANDS BV

Inventor： TANASA GHEORGHE ,  TEN KATE NICOLAAS ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  PHILIPS DANNY MARIA HUBERTUS ,  SCHEPERS MAIKEL ADRIANUS CORNERLIS ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table. [Figure 6]

公开(公告)号：SG147423A1

公开(公告)日：2008-11-28

申请号：SG2008075285

申请日：2006-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.