LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

    公开(公告)号:SG182052A1

    公开(公告)日:2012-07-30

    申请号:SG2011085982

    申请日:2011-11-21

    Abstract: Lithography apparatus comprising a projection system a carrier; and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y, wherein: the drive system comprises: a shuttle constructed and arranged to move parallel to the Y-axis; a shuttle connector for connecting the shuttle to the carrier, the shuttle connector being such as to allow movement of the carrier in a direction parallel to the X-axis relative to the shuttle; and a shuttle driver for driving movement of the shuttle parallel to the Y-axis, wherein: the shuttle is located to one side only of the carrier in a direction parallel to the X-axis and only one of the shuttle is connected to the carrier; and the shuttle driver and shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.Fig. 1

    LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS

    公开(公告)号:SG162668A1

    公开(公告)日:2010-07-29

    申请号:SG2009079930

    申请日:2009-12-01

    Abstract: A lithographic apparatus includes a moveable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the moveable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object. [Figure 1]

    LITHOGRAPHIC APPARATUS AND APPARATUS ADJUSTMENT METHOD

    公开(公告)号:SG109555A1

    公开(公告)日:2005-03-30

    申请号:SG200404419

    申请日:2004-08-06

    Abstract: A lithographic projection apparatus comprises a support table for holding a substrate or a mask etc. across a beam path. The support table has a support surface and an array of protrusions extending from the support surface, so as to support a backside of the substrate etc. on the protrusions. A detector is provided for detecting height deviations of respective ones of the protrusions that affect a surface flatness of the substrate etc.. A position selective material removing and/or adding device, is arranged to act independently on individual protrusions when the substrate table is operable in the apparatus, in the case of a removing device with sufficient removing strength to remove part of the protrusion material from the individual protrusion. A control unit controls the material removing and/or adding device to remove and/or add an amount of material corresponding to respective detected height deviations of respective ones of the protrusions selectively from or to the respective ones of the protrusions.

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