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公开(公告)号:NL2011760A
公开(公告)日:2014-01-13
申请号:NL2011760
申请日:2013-11-08
Applicant: ASML NETHERLANDS BV , ZEISS CARL SMT GMBH
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公开(公告)号:NL2010193A
公开(公告)日:2013-08-06
申请号:NL2010193
申请日:2013-01-28
Applicant: ASML NETHERLANDS BV , KONINKL PHILIPS ELECTRONICS NV
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公开(公告)号:NL2010185A
公开(公告)日:2013-08-01
申请号:NL2010185
申请日:2013-01-25
Applicant: ASML NETHERLANDS BV
Inventor: KOEVOETS ADRIANUS , DONDERS SJOERD , SCHOOT JAN , ZAAL KOEN , CADEE THEODORUS PETRUS MARIA
IPC: G03F7/20
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公开(公告)号:NL2009874A
公开(公告)日:2013-06-26
申请号:NL2009874
申请日:2012-11-23
Applicant: ASML NETHERLANDS BV
Inventor: CADEE THEODORUS PETRUS MARIA , ZAAL KOEN , SINGH HARMEET
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公开(公告)号:NL2010628A
公开(公告)日:2013-10-29
申请号:NL2010628
申请日:2013-04-12
Applicant: ASML NETHERLANDS BV
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公开(公告)号:NL2009338A
公开(公告)日:2013-03-26
申请号:NL2009338
申请日:2012-08-22
Applicant: ASML NETHERLANDS BV
Inventor: HUANG YANG-SHAN , GROOT ANTONIUS , CADEE THEODORUS PETRUS MARIA , VALENTIN CHRISTIAAN LOUIS
IPC: G03F7/20 , H01L21/683
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公开(公告)号:SG182052A1
公开(公告)日:2012-07-30
申请号:SG2011085982
申请日:2011-11-21
Applicant: ASML NETHERLANDS BV
Inventor: VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , DE GROOT ANTONIUS FRANCISCUS JOHANNES , CADEE THEODORUS PETRUS MARIA , DE BOEIJ JEROEN
Abstract: Lithography apparatus comprising a projection system a carrier; and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y, wherein: the drive system comprises: a shuttle constructed and arranged to move parallel to the Y-axis; a shuttle connector for connecting the shuttle to the carrier, the shuttle connector being such as to allow movement of the carrier in a direction parallel to the X-axis relative to the shuttle; and a shuttle driver for driving movement of the shuttle parallel to the Y-axis, wherein: the shuttle is located to one side only of the carrier in a direction parallel to the X-axis and only one of the shuttle is connected to the carrier; and the shuttle driver and shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.Fig. 1
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公开(公告)号:SG162668A1
公开(公告)日:2010-07-29
申请号:SG2009079930
申请日:2009-12-01
Applicant: ASML NETHERLANDS BV
Inventor: GILISSEN NOUD JAN , CADEE THEODORUS PETRUS MARIA
Abstract: A lithographic apparatus includes a moveable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the moveable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object. [Figure 1]
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公开(公告)号:SG136117A1
公开(公告)日:2007-10-29
申请号:SG2007025513
申请日:2007-04-05
Applicant: ASML NETHERLANDS BV
Inventor: WIJCKMANS MAURICE , CUIJPERS MARTINUS AGNES WILLEM , DE JONG FREDERIK EDUARD , VAN GOMPEL EDWIN AUGUSTINUS MA , JANSEN ROB , KUSTERS GERARDUS ADRIANUS ANTO , CADEE THEODORUS PETRUS MARIA , SMEETS MARTIN FRANS PIERRE , VAN DER MEULEN FRITS , SIMONS WILHELMUS FRANCISCUS JO , LEENDERS MARTINUS HENDRIKUS AN , OTTENS JOOST JEROEN , VAN BAREN MARTIJN
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公开(公告)号:SG109555A1
公开(公告)日:2005-03-30
申请号:SG200404419
申请日:2004-08-06
Applicant: ASML NETHERLANDS BV
Inventor: VINK JACOB WILLEM , DONDERS SJOERD NICOLAAS LAMBER , MODDERMAN THEODORUS MARINUS , CADEE THEODORUS PETRUS MARIA
IPC: H01L21/683 , G03F7/20 , H01L21/027
Abstract: A lithographic projection apparatus comprises a support table for holding a substrate or a mask etc. across a beam path. The support table has a support surface and an array of protrusions extending from the support surface, so as to support a backside of the substrate etc. on the protrusions. A detector is provided for detecting height deviations of respective ones of the protrusions that affect a surface flatness of the substrate etc.. A position selective material removing and/or adding device, is arranged to act independently on individual protrusions when the substrate table is operable in the apparatus, in the case of a removing device with sufficient removing strength to remove part of the protrusion material from the individual protrusion. A control unit controls the material removing and/or adding device to remove and/or add an amount of material corresponding to respective detected height deviations of respective ones of the protrusions selectively from or to the respective ones of the protrusions.
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