公开(公告)号：JP2006165562A

公开(公告)日：2006-06-22

申请号：JP2005351544

申请日：2005-12-06

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS L H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method. SOLUTION: A lithography device is disclosed, wherein a liquid-supplying system supplies liquid to a region between a substrate W and a projection system PL of the lithography device, having a liquid containment structure which is fixed to a surface almost vertical to the optical axis of the projection system PL to hold the substrate W so as to limit the liquid to the region the upper surface of a substrate table WT so that the side of the substrate W to be exposed is covered with liquid during exposure. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 解决方案：公开了一种光刻设备，其中液体供应系统向基板W和光刻设备的投影系统PL之间的区域供应液体，该区域具有液体容纳结构，该液体容纳结构固定在几乎垂直于 投影系统PL的光轴以保持基板W，以将液体限制在基板台WT的上表面的区域，使得在曝光期间被暴露的基板W的一侧被液体覆盖。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：WO2006084641A2

公开(公告)日：2006-08-17

申请号：PCT/EP2006001005

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：DE602006000372D1

公开(公告)日：2008-02-14

申请号：DE602006000372

申请日：2006-02-13

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: G03F7/20

公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

公开(公告)号：NL1036766A1

公开(公告)日：2009-10-27

申请号：NL1036766

申请日：2009-03-24

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF FREDERIK DE ,  NET ANTONIUS JOHANNUS VAN DER ,  STAVENGA MARCO KOERT ,  CUIJPERS JOHANNES WILHELMUS JA ,  HEUVEL MARTINUS WILHELMUS VAN

IPC: G03F7/20

公开(公告)号：SG152216A1

公开(公告)日：2009-05-29

申请号：SG2008083131

申请日：2008-11-06

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  STAVENGA MARCO KOERT ,  WONG PATRICK ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  DE VRIES DIRK ,  BESSEMS DAVID ,  MYCKE JACQUES ROGER ALICE

Abstract: Method of Preparing a Substrate for Lithography, a Substrate a Device Manufacturing Method, a Sealing Coating Applicator and a Sealing Coating Measurement Apparatus A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.

公开(公告)号：SG145770A1

公开(公告)日：2008-09-29

申请号：SG2008062531

申请日：2006-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

公开(公告)号：SG109609A1

公开(公告)日：2005-03-30

申请号：SG200405049

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

公开(公告)号：DE602004029970D1

公开(公告)日：2010-12-23

申请号：DE602004029970

申请日：2004-08-25

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODORE MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  SEUNTIENS-GRUDA LEJLA

IPC: G03F7/20 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  H01L21/027

公开(公告)号：SG125208A1

公开(公告)日：2006-09-29

申请号：SG200600932

申请日：2006-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.