公开(公告)号：NL1036924A1

公开(公告)日：2009-12-03

申请号：NL1036924

申请日：2009-05-05

Applicant: ASML NETHERLANDS BV

Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN MARCUS MARTINUS PETRUS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：SG147422A1

公开(公告)日：2008-11-28

申请号：SG2008075251

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

Abstract: Lithographic Apparatus and Device Manufacturing Method An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

公开(公告)号：SG126920A1

公开(公告)日：2006-11-29

申请号：SG200602939

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF DE ROELOF FREDERICK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LEENDERS MARTINUS HENDRIKUS A ,  MERTENS JEROEN JOHANNES SOPHIA M ,  RIEPEN MICHEL

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps (22,25) in the substrate table (WT) by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. The apparatus comprises a device (32) configured to extract liquid, gas or both from the gap. The device configured to extract liquid, gas or both comprises a membrane configured to allow gas but not liquid to be extracted from the gap.

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.