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公开(公告)号:CN103515252B
公开(公告)日:2018-01-30
申请号:CN201310158510.7
申请日:2013-05-02
Applicant: 新科金朋有限公司
IPC: H01L21/56 , H01L21/60 , H05K3/34 , H01L23/31 , H01L23/538
CPC classification number: H01L23/49827 , H01L21/4853 , H01L21/56 , H01L21/561 , H01L21/568 , H01L21/78 , H01L23/3114 , H01L23/3121 , H01L23/3128 , H01L23/49811 , H01L23/49816 , H01L23/49822 , H01L23/5389 , H01L23/562 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/19 , H01L24/20 , H01L24/24 , H01L24/27 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/81 , H01L24/82 , H01L24/83 , H01L24/85 , H01L24/92 , H01L24/94 , H01L24/97 , H01L25/03 , H01L25/50 , H01L2224/0401 , H01L2224/04042 , H01L2224/04105 , H01L2224/05082 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/06131 , H01L2224/06133 , H01L2224/1132 , H01L2224/11334 , H01L2224/1134 , H01L2224/1145 , H01L2224/11462 , H01L2224/11464 , H01L2224/11849 , H01L2224/11901 , H01L2224/12105 , H01L2224/131 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/16225 , H01L2224/2101 , H01L2224/215 , H01L2224/2401 , H01L2224/24011 , H01L2224/2402 , H01L2224/245 , H01L2224/27334 , H01L2224/32225 , H01L2224/32245 , H01L2224/45147 , H01L2224/48091 , H01L2224/48225 , H01L2224/48227 , H01L2224/48245 , H01L2224/48247 , H01L2224/48811 , H01L2224/48824 , H01L2224/48839 , H01L2224/48844 , H01L2224/48847 , H01L2224/48855 , H01L2224/73253 , H01L2224/73265 , H01L2224/73267 , H01L2224/81191 , H01L2224/82101 , H01L2224/82104 , H01L2224/82106 , H01L2224/83132 , H01L2224/83191 , H01L2224/83192 , H01L2224/83856 , H01L2224/85411 , H01L2224/85424 , H01L2224/85439 , H01L2224/85444 , H01L2224/85447 , H01L2224/85455 , H01L2224/92147 , H01L2224/92244 , H01L2224/92247 , H01L2224/94 , H01L2224/97 , H01L2924/00011 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/15311 , H01L2924/181 , H01L2924/1815 , H01L2924/3025 , H01L2924/3511 , H01L2924/3512 , H01L2924/00014 , H01L2924/00 , H01L2224/03 , H01L2924/00012 , H01L2224/83 , H01L2224/85 , H01L2224/27 , H01L2924/014 , H01L2924/01082 , H01L2924/0105 , H01L2224/81805 , H01L2924/01005
Abstract: 本发明涉及形成嵌入式SoP扇出型封装的半导体器件和方法。一种半导体器件,包括球栅阵列(BGA)封装,球栅阵列(BGA)封装包括第一凸块。在第一凸块之间将第一半导体管芯安装至BGA封装。将BGA封装和第一半导体管芯安装至载体。将第一密封剂沉积在载体之上以及BGA封装和第一半导体管芯周围。移除载体,以暴露第一凸块和第一半导体管芯。将互连结构电连接至第一凸块和第一半导体管芯。BGA封装还包括衬底和第二半导体管芯,第二半导体管芯被安装且电连接至衬底。将第二密封剂沉积在第二半导体管芯和衬底之上。在衬底之上与第二半导体管芯相对地形成第一凸块。在BGA封装之上形成翘曲平衡层。
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公开(公告)号:CN107256853A
公开(公告)日:2017-10-17
申请号:CN201710272117.9
申请日:2012-02-09
Applicant: 台湾积体电路制造股份有限公司
IPC: H01L23/522 , H01L23/488 , H01L23/498 , H01L21/768
CPC classification number: H01L23/291 , H01L23/293 , H01L23/3171 , H01L23/525 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/81 , H01L2224/02313 , H01L2224/02331 , H01L2224/02381 , H01L2224/0239 , H01L2224/03424 , H01L2224/03452 , H01L2224/0346 , H01L2224/03462 , H01L2224/03464 , H01L2224/0391 , H01L2224/0401 , H01L2224/05008 , H01L2224/05111 , H01L2224/05124 , H01L2224/05155 , H01L2224/05164 , H01L2224/05548 , H01L2224/05562 , H01L2224/05567 , H01L2224/05573 , H01L2224/05583 , H01L2224/05611 , H01L2224/05644 , H01L2224/05647 , H01L2224/08503 , H01L2224/11334 , H01L2224/1146 , H01L2224/11849 , H01L2224/13022 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13139 , H01L2224/13147 , H01L2224/13155 , H01L2224/16225 , H01L2224/16237 , H01L2224/16503 , H01L2924/00014 , H01L2924/01028 , H01L2924/01029 , H01L2924/01047 , H01L2924/01082 , H01L2924/01083 , H01L2924/01327 , H01L2924/014 , H01L2924/12042 , H01L2924/2064 , H01L2924/00 , H01L2224/05552 , H01L23/5221 , H01L21/76843 , H01L23/488 , H01L23/49811
Abstract: 一种半导体器件包括:导电层,该导电层通过浸镀锡工艺形成于钝化后互连(PPI)结构的表面上;聚合物层,该聚合物层形成于导电层上并且经图案化具有暴露出一部分导电层的开口;以及焊料凸块,该焊料凸块形成于聚合物层的开口中以电连接至PPI结构。本发明提供了钝化后互连结构及其形成方法。
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公开(公告)号:CN107039337A
公开(公告)日:2017-08-11
申请号:CN201610882505.4
申请日:2016-10-10
Applicant: 商升特公司
IPC: H01L21/768 , H01L23/538
CPC classification number: H01L25/065 , H01L21/4825 , H01L21/486 , H01L21/4882 , H01L21/56 , H01L21/561 , H01L21/565 , H01L23/295 , H01L23/3107 , H01L23/3121 , H01L23/3192 , H01L23/367 , H01L23/4334 , H01L23/49541 , H01L23/49827 , H01L23/552 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/81 , H01L24/97 , H01L25/50 , H01L2224/05008 , H01L2224/05548 , H01L2224/05567 , H01L2224/05569 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664 , H01L2224/1132 , H01L2224/1145 , H01L2224/11452 , H01L2224/1146 , H01L2224/1147 , H01L2224/13005 , H01L2224/13013 , H01L2224/13014 , H01L2224/13022 , H01L2224/13082 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13166 , H01L2224/13184 , H01L2224/16057 , H01L2224/16238 , H01L2224/32245 , H01L2224/73253 , H01L2224/81011 , H01L2224/81024 , H01L2224/81191 , H01L2224/81815 , H01L2224/94 , H01L2224/97 , H01L2924/3841 , H01L2224/11 , H01L2924/00014 , H01L2924/01047 , H01L2924/01029 , H01L2924/01028 , H01L2924/01079 , H01L2924/01046 , H01L2924/2064 , H01L2924/2075 , H01L2924/20751 , H01L2924/20752 , H01L2924/20753 , H01L2924/20754 , H01L2224/03 , H01L2224/81 , H01L21/76885 , H01L23/5386
Abstract: 本发明涉及用有微柱的半导体管芯形成DCALGA封装的方法和半导体器件。半导体器件具有布置在衬底之上的第一半导体管芯。在半导体管芯之上形成多个复合互连结构。复合互连结构具有不可熔导电柱和在不可熔导电柱之上形成的可熔层。可熔层被回流以将第一半导体管芯连接到衬底的导电层。不可熔导电柱在回流期间不熔化,从而消除了在衬底之上形成阻焊剂的需要。将密封剂沉积在第一半导体管芯和复合互连结构周围。密封剂在第一半导体管芯的有源表面和衬底之间流动。第二半导体管芯相邻于第一半导体管芯布置在衬底之上。散热器布置在第一半导体管芯之上。密封剂的一部分被移除以暴露散热器。
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公开(公告)号:CN106469656A
公开(公告)日:2017-03-01
申请号:CN201610659713.8
申请日:2016-08-12
Applicant: 商升特公司
IPC: H01L21/48 , H01L21/768 , H01L23/373 , H01L23/538 , H01L23/552 , H01L25/04
CPC classification number: H01L23/5389 , H01L21/4857 , H01L21/486 , H01L21/4882 , H01L21/56 , H01L21/78 , H01L23/13 , H01L23/16 , H01L23/3107 , H01L23/3121 , H01L23/367 , H01L23/3675 , H01L23/433 , H01L23/481 , H01L23/49827 , H01L23/50 , H01L23/5383 , H01L23/5385 , H01L23/5386 , H01L23/552 , H01L24/17 , H01L24/81 , H01L24/97 , H01L25/0652 , H01L25/0657 , H01L25/50 , H01L2223/6677 , H01L2224/0345 , H01L2224/03452 , H01L2224/03462 , H01L2224/03464 , H01L2224/0401 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05164 , H01L2224/0557 , H01L2224/05573 , H01L2224/05575 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664 , H01L2224/1132 , H01L2224/1145 , H01L2224/11464 , H01L2224/11849 , H01L2224/13013 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/16113 , H01L2224/16146 , H01L2224/16227 , H01L2224/1703 , H01L2224/1713 , H01L2224/17181 , H01L2224/32245 , H01L2224/73253 , H01L2224/80 , H01L2224/81201 , H01L2224/81203 , H01L2224/81815 , H01L2224/94 , H01L2224/97 , H01L2225/06513 , H01L2225/06517 , H01L2225/06537 , H01L2225/06541 , H01L2225/06548 , H01L2225/06555 , H01L2225/06582 , H01L2225/06589 , H01L2924/0132 , H01L2924/0133 , H01L2924/10252 , H01L2924/10253 , H01L2924/10272 , H01L2924/10322 , H01L2924/10324 , H01L2924/10329 , H01L2924/1033 , H01L2924/10335 , H01L2924/1305 , H01L2924/1306 , H01L2924/1433 , H01L2924/14335 , H01L2924/1434 , H01L2924/1461 , H01L2924/15153 , H01L2924/15156 , H01L2924/15192 , H01L2924/15311 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19104 , H01L2924/3025 , H01L2924/01082 , H01L2924/01047 , H01L2924/01029 , H01L2924/01028 , H01L2924/01079 , H01L2924/01046 , H01L2224/11 , H01L2224/03 , H01L2224/81 , H01L21/76898 , H01L23/3736 , H01L23/5384 , H01L25/04
Abstract: 本发明公开形成倒金字塔式腔体半导体封装的方法和半导体装置。一种半导体装置具有第一衬底。在第一衬底上形成传导层。第一腔体贯穿第一衬底被形成并且延伸到传导层。在第一腔体中设置包括多个第一互连结构的第一半导体管芯。在第一衬底上设置第二衬底。贯穿第二衬底形成第二腔体。在第二腔体中设置包括多个第二互连结构的第二半导体管芯。在第二半导体管芯上设置分立装置或第三半导体管芯。在第二衬底与分立装置或第三半导体管芯之间形成多个第三互连结构。同时地使第一、第二以及第三互连结构回流。在第一半导体管芯、第二半导体管芯以及分立装置或第三半导体管芯上和周围沉积密封剂。
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公开(公告)号:CN103890940B
公开(公告)日:2017-03-01
申请号:CN201180074420.9
申请日:2011-10-28
Applicant: 英特尔公司
CPC classification number: H01L23/5384 , H01L21/6835 , H01L21/76807 , H01L21/76898 , H01L23/291 , H01L23/3171 , H01L23/481 , H01L23/522 , H01L23/5286 , H01L23/5386 , H01L24/03 , H01L24/05 , H01L24/08 , H01L24/13 , H01L24/17 , H01L2221/6835 , H01L2224/0235 , H01L2224/02372 , H01L2224/02375 , H01L2224/024 , H01L2224/0401 , H01L2224/05548 , H01L2224/05567 , H01L2224/05611 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05657 , H01L2224/05664 , H01L2224/11002 , H01L2224/13022 , H01L2224/13024 , H01L2224/13111 , H01L2224/13116 , H01L2224/13144 , H01L2224/13147 , H01L2224/14131 , H01L2224/16145 , H01L2224/16225 , H01L2224/17106 , H01L2924/00014 , H01L2924/13091 , H01L2924/1434 , H01L2924/1461 , H01L2924/186 , H01L2924/381 , H01L2924/01015 , H01L2924/01074 , H01L2924/01029 , H01L2924/0105 , H01L2924/01047 , H01L2924/00 , H01L2224/05552
Abstract: 说明了一种3D互连结构和制造方法,其中,使用双镶嵌型工艺流程形成穿硅过孔(TSV)和金属再分布层(RDL)。可以在减薄的器件晶片背侧和RDL之间提供氮化硅或碳化硅钝化层,以在工艺流程过程中提供密封屏障和蚀刻停止层。
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公开(公告)号:CN103219326B
公开(公告)日:2016-12-28
申请号:CN201310102406.6
申请日:2008-07-25
Applicant: 株式会社尼康
IPC: H01L25/065 , H01L23/36 , H01L23/473
CPC classification number: H01L23/34 , H01L21/563 , H01L23/3128 , H01L23/36 , H01L23/473 , H01L25/0657 , H01L2224/0554 , H01L2224/05573 , H01L2224/05611 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/13025 , H01L2224/16145 , H01L2224/16225 , H01L2225/06541 , H01L2225/06589 , H01L2924/00014 , H01L2924/15311 , H01L2924/15321 , H01L2224/05599 , H01L2224/0555 , H01L2224/0556
Abstract: 本发明提供一种层叠型半导体器件,可以使热分散提高,进一步提高散热效率。本发明是层叠有多个半导体芯片(20-1、20-2)、该半导体芯片各自具有至少一个电路区域的层叠型半导体器件(100),按照伴随着电路区域的驱动从电路区域中放出的热被分散的方式,配置电路区域。在上述层叠型半导体器件(100)中,还具备将从电路区域中放出的热散出的散热部(50),按照使多个电路区域中的每单位面积的放热量越多的区域与散热部之间的热阻越小的方式,配置电路区域。
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公开(公告)号:CN105992625A
公开(公告)日:2016-10-05
申请号:CN201480009301.9
申请日:2014-09-18
Applicant: 英特尔公司
IPC: A99Z99/00
CPC classification number: H01L25/162 , H01L21/568 , H01L23/5389 , H01L24/05 , H01L24/16 , H01L24/19 , H01L24/20 , H01L24/96 , H01L24/97 , H01L25/03 , H01L25/105 , H01L25/50 , H01L2224/04105 , H01L2224/05571 , H01L2224/05611 , H01L2224/12105 , H01L2224/131 , H01L2224/16145 , H01L2224/16227 , H01L2224/16505 , H01L2224/24137 , H01L2224/24195 , H01L2224/48227 , H01L2224/96 , H01L2225/06517 , H01L2225/0652 , H01L2225/06548 , H01L2225/06555 , H01L2225/06572 , H01L2225/1035 , H01L2225/1041 , H01L2225/1058 , H01L2924/00014 , H01L2924/01013 , H01L2924/01029 , H01L2924/01079 , H01L2924/014 , H01L2924/141 , H01L2924/1421 , H01L2924/1434 , H01L2924/15192 , H01L2924/15311 , H01L2924/15313 , H01L2924/15321 , H01L2924/15323 , H01L2924/15331 , H01L2924/19011 , H01L2924/19041 , H01L2924/19043 , H01L2924/19105 , H01L2924/3651 , H01L2224/81
Abstract: 本发明的实施例包括多管芯封装和制造此类多管芯封装的方法。在实施例中,模制层具有第一表面和与第一表面相反的第二表面。各自具有可焊接端子的一个或多个第一电部件被定向成面向模制层的第一表面。模制层还可具有一个或多个第二电部件,一个或多个第二电部件各自具有定向成面向模制层的第二表面的第二类型的端子。实施例还可包括形成于模制层的第一表面和模制层的第二表面之间的一个或多个导电通孔。因此,可形成从模制层的第二表面到定向成面向模制层的第一表面的第一电部件的电连接。
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公开(公告)号:CN102651357B
公开(公告)日:2016-09-28
申请号:CN201210034217.5
申请日:2012-02-15
Applicant: 精工爱普生株式会社
Inventor: 今井英生
IPC: H01L23/48 , H01L25/065
CPC classification number: H01L23/481 , H01L21/76898 , H01L23/562 , H01L25/0657 , H01L25/074 , H01L2224/03462 , H01L2224/0401 , H01L2224/05009 , H01L2224/05553 , H01L2224/05567 , H01L2224/0557 , H01L2224/05571 , H01L2224/05609 , H01L2224/05611 , H01L2224/05613 , H01L2224/05616 , H01L2224/05618 , H01L2224/05624 , H01L2224/05639 , H01L2224/05647 , H01L2224/05655 , H01L2224/06181 , H01L2224/11462 , H01L2224/11464 , H01L2224/13007 , H01L2224/13017 , H01L2224/13022 , H01L2224/13144 , H01L2224/16146 , H01L2224/16147 , H01L2224/16237 , H01L2224/8114 , H01L2224/81191 , H01L2224/81895 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2924/01327 , H01L2924/00
Abstract: 本发明提供半导体装置、传感器以及电子设备,该传感器具有该半导体装置。在形成有突起电极的第二基板上层叠形成有贯通电极的第一基板,在贯通电极中具有凹部,突起电极进入并层叠在凹部,突起电极的顶端宽度比凹部的开口宽度小。
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公开(公告)号:CN105934813A
公开(公告)日:2016-09-07
申请号:CN201580005967.1
申请日:2015-02-16
Applicant: 三菱电机株式会社
IPC: H01L21/28 , H01L21/3205 , H01L21/329 , H01L21/768 , H01L23/522 , H01L23/532 , H01L29/41 , H01L29/47 , H01L29/872
CPC classification number: H01L24/13 , H01L23/3135 , H01L23/3192 , H01L23/36 , H01L23/3735 , H01L23/564 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/33 , H01L29/1608 , H01L29/401 , H01L29/47 , H01L29/6606 , H01L29/872 , H01L2224/02166 , H01L2224/0345 , H01L2224/03452 , H01L2224/0346 , H01L2224/0347 , H01L2224/03614 , H01L2224/03914 , H01L2224/04026 , H01L2224/05084 , H01L2224/05085 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05166 , H01L2224/05187 , H01L2224/05556 , H01L2224/05562 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05655 , H01L2224/06181 , H01L2224/10126 , H01L2224/13082 , H01L2224/13147 , H01L2224/13582 , H01L2224/13611 , H01L2224/13624 , H01L2224/13639 , H01L2224/13644 , H01L2224/13655 , H01L2224/33181 , H01L2924/00014 , H01L2924/05042 , H01L2924/10272 , H01L2924/12032 , H01L2924/13055 , H01L2924/13091 , H01L2924/181 , H01L2924/04941 , H01L2224/056 , H01L2224/051 , H01L2924/00 , H01L2924/00012
Abstract: 本发明的目的在于提供在高温动作中也抑制Cu布线的氧化的半导体装置。本发明的半导体装置具备:基板(1),具有主面;Cu电极(8),选择性地形成于基板(1)的主面一侧;氧化防止膜(14),形成于Cu电极(8)的上表面的除其端部以外的区域;有机树脂膜(10),形成于基板(1)的主面上,遮覆Cu电极(8)的侧面以及上表面的端部;以及扩散防止膜(11),在有机树脂膜(10)与基板(1)的主面之间,与两者相接而形成,并在有机树脂膜(10)与Cu电极(8)的侧面以及上表面的端部之间,与两者相接而形成。
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公开(公告)号:CN102842531B
公开(公告)日:2016-09-07
申请号:CN201210207020.7
申请日:2012-06-21
Applicant: 新科金朋有限公司
IPC: H01L21/768 , H01L23/528
CPC classification number: H01L24/13 , H01L23/3171 , H01L24/03 , H01L24/05 , H01L24/10 , H01L24/11 , H01L2224/0345 , H01L2224/03452 , H01L2224/0346 , H01L2224/03912 , H01L2224/0401 , H01L2224/05022 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05552 , H01L2224/05555 , H01L2224/05572 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05666 , H01L2224/11 , H01L2224/1145 , H01L2224/11452 , H01L2224/1146 , H01L2224/1147 , H01L2224/11472 , H01L2224/11822 , H01L2224/11906 , H01L2224/13 , H01L2224/13007 , H01L2224/13017 , H01L2224/13076 , H01L2224/13082 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13166 , H01L2224/13562 , H01L2224/1357 , H01L2224/13609 , H01L2224/13611 , H01L2224/81191 , H01L2224/81201 , H01L2224/81815 , H01L2224/94 , H01L2924/01322 , H01L2924/01327 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2224/03 , H01L2924/00014 , H01L2924/00
Abstract: 本发明涉及在种子层之上形成互连结构的半导体器件和方法。一种半导体器件具有半导体管芯,在管芯之上形成有第一导电层。在管芯之上形成第一绝缘层,第一绝缘层中的第一开口被设置在第一导电层之上。在第一绝缘层之上并进入到第一导电层之上的第一开口中形成第二导电层。通过在第一绝缘层之上形成具有小于第一开口的宽度的第二开口的第二绝缘层并向第二开口中沉积导电材料来构造互连结构。该互连结构可以是导电柱或导电焊盘。互连结构具有比第一开口的宽度小的宽度。去除第一开口外面的第一绝缘层之上的第二导电层,同时留下互连结构下面的第二导电层。
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