公开(公告)号：JP2005150734A

公开(公告)日：2005-06-09

申请号：JP2004328567

申请日：2004-11-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343102A

公开(公告)日：2004-12-02

申请号：JP2004132528

申请日：2004-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method capable of compensating for or improving the effect of a thick pellicle.
SOLUTION: The thick pellicle is characterized for calculating a correction to be applied in exposure so that the hick pellicle is allowed to have a non-flat shape and the shape compensates for the optical effect of the pellicle. As the pellicle readily compensates for, it can be mounted in such a manner as to employ a one-dimensional shape under the influence of gravity.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG118242A1

公开(公告)日：2006-01-27

申请号：SG200402194

申请日：2004-04-22

Applicant: ASML NETHERLANDS BV

Inventor： WEHRENS MARTIJN GERARD DOMINIQUE ,  UITTERDIJK TAMMO ,  LUIJTEN CARLO CORNELIS MARIA ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  BRULS RICHARD JOSEPH ,  PONGERS WILLEM RICHARD ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  JANSEN ALBERT JOHANNES MARIA ,  DIJK VAN HENDRIKUS ALPHONSUS LUDOVICUS ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MARIA ,  DEMARTEAU MARCEL JOHANNES LOUIS MARIE

IPC: G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20 ,  H01L21/027

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.

公开(公告)号：SG128601A1

公开(公告)日：2007-01-30

申请号：SG200604016

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS RUDOLF ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  ES VAN JOHANNES