中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

84 records (took 0.023 seconds)

    SPECTRAL PURITY FILTER
    46.
    发明专利
    SPECTRAL PURITY FILTER 未知

    公开(公告)号：SG184557A1

    公开(公告)日：2012-11-29

    申请号：SG2012075628

    申请日：2011-02-22

    Applicant: ASML NETHERLANDS BV

    Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

    Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

    METHODS AND APPARATUS FOR INSPECTION OF ARTICLES, EUV LITHOGRAPHY RETICLES, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES.
    47.
    发明专利
    METHODS AND APPARATUS FOR INSPECTION OF ARTICLES, EUV LITHOGRAPHY RETICLES, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES. 未知

    公开(公告)号：NL2007108A

    公开(公告)日：2012-02-06

    申请号：NL2007108

    申请日：2011-07-14

    Applicant: ASML NETHERLANDS BV

    Inventor： KOOLE ROELOF ,  BANINE VADIM ,  SCACCABAROZZI LUIGI ,  YILDIRIM OKTAY

    IPC: G03F7/20

    Abstract: An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.

    IMPRINT LITHOGRAPHY.
    48.
    发明专利
    IMPRINT LITHOGRAPHY. 未知

    公开(公告)号：NL2005259A

    公开(公告)日：2011-03-30

    申请号：NL2005259

    申请日：2010-08-24

    Applicant: ASML NETHERLANDS BV

    Inventor： BOEF ARIE ,  BANINE VADIM ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

    IPC: G03F7/00

    Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

Patent Agency Ranking