公开(公告)号：SG109609A1

公开(公告)日：2005-03-30

申请号：SG200405049

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

公开(公告)号：SG108997A1

公开(公告)日：2005-02-28

申请号：SG200404366

申请日：2004-07-22

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：DE602005020891D1

公开(公告)日：2010-06-10

申请号：DE602005020891

申请日：2005-11-22

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MATHUES ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDERTUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  STREEFKERK BOB

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet (24) configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet (26) configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate (W).

公开(公告)号：DE602006009174D1

公开(公告)日：2009-10-29

申请号：DE602006009174

申请日：2006-04-26

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERICK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：SG109555A1

公开(公告)日：2005-03-30

申请号：SG200404419

申请日：2004-08-06

Applicant: ASML NETHERLANDS BV

Inventor： VINK JACOB WILLEM ,  DONDERS SJOERD NICOLAAS LAMBER ,  MODDERMAN THEODORUS MARINUS ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus comprises a support table for holding a substrate or a mask etc. across a beam path. The support table has a support surface and an array of protrusions extending from the support surface, so as to support a backside of the substrate etc. on the protrusions. A detector is provided for detecting height deviations of respective ones of the protrusions that affect a surface flatness of the substrate etc.. A position selective material removing and/or adding device, is arranged to act independently on individual protrusions when the substrate table is operable in the apparatus, in the case of a removing device with sufficient removing strength to remove part of the protrusion material from the individual protrusion. A control unit controls the material removing and/or adding device to remove and/or add an amount of material corresponding to respective detected height deviations of respective ones of the protrusions selectively from or to the respective ones of the protrusions.

公开(公告)号：DE602005020720D1

公开(公告)日：2010-06-02

申请号：DE602005020720

申请日：2005-08-05

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KEMPER NICOLAAS RUDOLF ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN DER TOORN JAN-GERARD CORNELIS ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BELFROID STEFAN PHILIP CHRISTIAAN ,  SMEULERS JOHANNES PETRUS MARIA ,  VOGEL HERMAN

IPC: G03F7/20

公开(公告)号：NL1036194A1

公开(公告)日：2009-06-04

申请号：NL1036194

申请日：2008-11-13

Applicant: ASML NETHERLANDS BV

Inventor： KROONEN ROGER JOHANNES MARIA HUBERTUS ,  CORNELISSEN SEBASTIAAN MARIA JOHANNES ,  DONDERS SJOERD NICOLAAS LAMBER ,  KATE NICOLAAS TEN ,  ROSET NIEK JACOBUS JOHANNES ,  JACOBS FRANSISCUS MATHIJS ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS ,  ROOS REINDER WIETSE ,  HOGELAND MATTIJS

IPC: G03F7/20

公开(公告)号：SG125948A1

公开(公告)日：2006-10-30

申请号：SG200401666

申请日：2004-03-26

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  ELP VAN JAN ,  HOOGKAMP JAN FREDERIK ,  MEER VAN ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPNAJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  BERG VAN DEN JOHANNES CHARLES ,  SANDE VAN DE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B25J15/00 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68 ,  H01L21/683 ,  H02N13/00

Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.

公开(公告)号：SG122937A1

公开(公告)日：2006-06-29

申请号：SG200507707

申请日：2005-11-30

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet (24) configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet (26) configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate (W).

公开(公告)号：DE602004010961T2

公开(公告)日：2009-01-02

申请号：DE602004010961

申请日：2004-06-25

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027