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公开(公告)号：SG148972A1
公开(公告)日：2009-01-29
申请号：SG2008048241
申请日：2008-06-25
Applicant: ASML NETHERLANDS BV
Inventor： NIHTIANOV STOYAN , VAN DER SIJS ARIE JOHAN , MOEST BEARRACH , KEMPER PETRUS WILHELMUS JOSEPHUS MARIA , HAAST MARC ANTONIUS MARIA , BAAS GERARDUS WILHELMUS PETRUS , NANVER LIS KAREN , SARUBBI FRANCESCO , SCHUWER ANTONIUS ANDREAS JOHANNES , GOMMEREN GREGORY MICHA , POT MARTIJN , SCHOLTES THOMAS LUDOVICUS MARIA
Abstract: RADIATION DETECTOR, METHOD OF MANUFACTURING A RADIATION DETECTOR AND LITHOGRAPHIC APPARATUS COMPRISING A RADIATION DETECTOR The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10 - 200 nm and/or for charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
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公开(公告)号：SG128584A1
公开(公告)日：2007-01-30
申请号：SG200603921
申请日：2006-06-08
Applicant: ASML NETHERLANDS BV
Inventor： REIJNEN MARTINUS CORNELIS , MAKAROVIC ANDREJ , KESSELS LAMBERTUS GERARDUS MAR , NIHTIANOV STOYAN , KEMPER PETRUS WILHELMUS JOSEPH , CHILOV KAMEN HRISTOV
Abstract: The present invention comprises a lithographic apparatus and device manufacturing method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.
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Patent Agency Ranking
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公开(公告)号：NL1035665A1
公开(公告)日：2009-01-13
申请号：NL1035665
申请日：2008-07-04
Applicant: ASML NETHERLANDS BV
Inventor： BRUGGEN OLAF HUBERTUS WILHELMUS VAN , AUER FRANK , BAGGEN MARCEL KOENRAAD MARIE , MEULEN FRITS VAN DER , VOGELSANG PATRICK DAVID , REIJNEN MARTINUS CORNELIS , DASSEL JOHANNES ROLAND , NIHTIANOV STOYAN , WAKKER REMKO , ZUTPHEN TOM VAN
IPC: G03F7/20 , H01L21/027
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公开(公告)号：NL2011568A
公开(公告)日：2014-05-06
申请号：NL2011568
申请日：2013-10-08
Applicant: ASML NETHERLANDS BV
Inventor： NIHTIANOV STOYAN , KOK HAICO , WEHRENS MARTIJN
IPC: G03F7/20 , H01L31/0216
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公开(公告)号：SG128650A1
公开(公告)日：2007-01-30
申请号：SG200604388
申请日：2006-06-27
Applicant: ASML NETHERLANDS BV
Inventor： MEULEN VAN DER FRITS , COX HENRIKUS HERMAN MARIE , HOUKES MARTIJN , VLIET VAN ROBERTUS JOHANNES , NIHTIANOV STOYAN , KEMPER PETRUS WILHELMUS JOSEPH , HANEGRAAF ROLAND PETRUS HENDRI
Abstract: A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system (LS) to supply an immersion fluid (IML) in a space between a downstream lens of the projection system and the substrate (W) and a leakage detection system (LDC) to detect leakage of the immersion fluid from the fluid supply system, the leakage detection system being constructed to detect leakage by measuring an electrical capacitance between two mutually isolated electrial conductors (COND1,COND2).
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公开(公告)号：SG120255A1
公开(公告)日：2006-03-28
申请号：SG200505017
申请日：2005-08-08
Applicant: ASML NETHERLANDS BV
Inventor： CADEE THEODORUS PETRUS MARIA C , JACOBS JOHANNES HENRICUS WILHE , TEN KATE NICOLAAS , LOOPSTRA ERIK ROELOF , VAN MEER ASCHWIN LODEWIJK HEND , MERTENS JEROEN JOHANNES SOPHIA , DE MOL CHRISTIANUS GERARDUS MA , MUITJENS MARCEL JOHANNUS ELISA , VAN DER NET ANTONIUS JOHANNUS , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABET , STAVENGA MARCO KOERT , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAIJ JACOBUS JOHANNUS LEON , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , NIHTIANOV STOYAN , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PET , JANSSEN FRANCISCUS JOHANNES JO , RIEPEN MICHEL
IPC: G03F7/20
Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.
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