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    LITHOGRAPHIC APPARATUS WITH PLANAR MOTOR DRIVEN SUPPORT
    107.
    发明专利
    LITHOGRAPHIC APPARATUS WITH PLANAR MOTOR DRIVEN SUPPORT 未知

    公开(公告)号：SG139665A1

    公开(公告)日：2008-02-29

    申请号：SG2007052038

    申请日：2007-07-12

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

    Abstract: LITHOGRAPHIC APPARATUS WITH PLANAR MOTOR DRIVEN SUPPORT A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal and a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of the patterning support and the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    108.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG139663A1

    公开(公告)日：2008-02-29

    申请号：SG2007052012

    申请日：2007-07-12

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN ,  SIMONS WILHELMUS FRANCISCUS JO

    Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feed forward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feed forward correction signal to be fed to the stage.

    Lithographic apparatus and device manufacturing method
    109.
    发明专利
    Lithographic apparatus and device manufacturing method 未知

    公开(公告)号：SG121949A1

    公开(公告)日：2006-05-26

    申请号：SG200506171

    申请日：2005-09-27

    Applicant: ASML NETHERLANDS BV

    Inventor： COX HENRIKUS HERMAN MARIE ,  BUTLER HANS ,  KUNST RONALD CASPER ,  SCHOOT VAN DER HARMEN KLAAS ,  VOS DE YOUSSEF KAREL MARIA

    Abstract: To enable high acceleration and high moving speed of a pattern support (PS) or a substrate table (ST) of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator (SLS,PLS) for relatively large displacements, whereas an actuator (SV,PV) for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

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