公开(公告)号：SG152931A1

公开(公告)日：2009-06-29

申请号：SG2007177637

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  BUTLER HANS ,  DONDERS SJOERD NOCOLAAS LAMBERTUS ,  KOLESNYCHENKO ALLEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.

公开(公告)号：DE60327119D1

公开(公告)日：2009-05-20

申请号：DE60327119

申请日：2003-10-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).

公开(公告)号：SG139674A1

公开(公告)日：2008-02-29

申请号：SG2007052996

申请日：2007-07-17

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN ,  STOELDRAIJER JUDOCUS MARIE DOM ,  DE KORT ANTONIUS JOHANNES ,  VAN DE MAST FRANCISCUS ,  DE JONG MARTEIJN

Abstract: LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral minor when the substrate table is at the measurement station.

公开(公告)号：SG136151A1

公开(公告)日：2007-10-29

申请号：SG2007164155

申请日：2005-03-30

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  MERTENS JEROEN JOHANNES SOPHIA ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG128601A1

公开(公告)日：2007-01-30

申请号：SG200604016

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS RUDOLF ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  ES VAN JOHANNES

公开(公告)号：SG121845A1

公开(公告)日：2006-05-26

申请号：SG200307557

申请日：2003-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BALLEGOIJ VAN ROBERTUS NICODEM ,  CUIJPERS MARTINUS AGNES WILLEM ,  MEIJERS PIETER JOHANNES GERTRU ,  NUNEN VAN GERARDUS PETRUS MATT ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A substrate holder (10) has burls (12) having a height between 60 and 100 mu m and at least 10 vacuum ports (13) arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.

公开(公告)号：SG121843A1

公开(公告)日：2006-05-26

申请号：SG200307554

申请日：2003-12-18

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  KERVINCK VAN MARCEL NICOLAAS J

IPC: G03F7/22 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A device manufacturing method includes using a patterning device to impart a beam of radiation with a pattern in its cross-section, projecting the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate, and projecting a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate. A cross-section of the beam projected on the substrate edge target portion has an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate. A part of the cross-section of the beam is incident on the substrate, and another part of the cross-section of the beam is not incident on the substrate.

公开(公告)号：SG113011A1

公开(公告)日：2005-07-28

申请号：SG200407675

申请日：2004-12-22

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  VAN DER SCHOOT HARMEN KLASS ,  STARREVELD JEROEN PIETER ,  MAAS WOUTERUS JOHANNES PETRUS ,  VENEMA WILLEM JURRIANUS ,  MENCHTCHIKOV BORIS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

Abstract: A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with prespecified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the prespecified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

公开(公告)号：DE602005018150D1

公开(公告)日：2010-01-21

申请号：DE602005018150

申请日：2005-10-14

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  DE JONG FREDERICK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS

IPC: G03F7/20 ,  H01L21/00

Abstract: A lithographic apparatus includes a substrate support (2) that is constructed to support a substrate (6), and a projection system (4) that is configured to project a patterned radiation beam (5) onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory (7) of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration (1) for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

公开(公告)号：NL1036835A1

公开(公告)日：2009-11-11

申请号：NL1036835

申请日：2009-04-08

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS JACOBS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MEULEN FRITS VAN DER ,  OTTENS JOOST JEROEN ,  SIJBEN ANKO JOZEF CORNELUS ,  MAAS WOUTERUS JOHANNES PETRUS ,  ABEELEN HENDRIKUS JOHANNES MARIA ,  VERSTEIJNEN HENRICUS PETRUS ,  STEFFENS PAULA

IPC: G03F7/20