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    LITHOGRAPHIC METHOD AND APPARATUS.
    142.
    发明专利
    LITHOGRAPHIC METHOD AND APPARATUS. 未知

    公开(公告)号：NL2005424A

    公开(公告)日：2011-05-02

    申请号：NL2005424

    申请日：2010-09-30

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  GROENENDIJK REMCO

    IPC: G03F7/20

    Abstract: A method is disclosed. A change in position of a substrate in a direction substantially parallel to a direction of propagation of a radiation beam that is, or is to be, projected on to that substrate is determined, which change in position would result in a lithographic error in the application of a pattern to that substrate using that radiation beam. The change in position of the substrate is used to control a property of the radiation beam when, or as, the radiation beam is projected onto the substrate in order to reduce the lithographic error.

    147.
    发明专利
    未知

    公开(公告)号：DE602005001870D1

    公开(公告)日：2007-09-20

    申请号：DE602005001870

    申请日：2005-02-17

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

    IPC: G03F7/20 ,  H01L21/027 ,  G03F9/00

    Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.

    149.
    发明专利
    未知

    公开(公告)号：DE69928328T2

    公开(公告)日：2006-06-29

    申请号：DE69928328

    申请日：1999-06-17

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  WARMERDAM THOMAS PETRUS HENDRI

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A lithographic projection apparatus has a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, first driving means, for moving the mask table in a given reference direction substantially parallel to the plane of the table, second driving means, for moving the substrate table parallel to the reference direction so as to be synchronous with the motion of the mask table. The lithographic projection apparatus also has a first measuring means, for determining the momentary position of the mask table with respect to a fixed reference point, second measuring means, for determining the momentary position of the substrate table with respect to a fixed reference point, and means for comparing the measured momentary position of the substrate table with a desired momentary position of the substrate table for generating a position error signal in accordance with a difference between the said two positions, and for passing that signal to correction means which serve to adjust the momentary position of the mask table so as to compensate for such difference. In a preferred embodiment, at least a portion of the position error signal is differentiated twice with respect to time before being passed to the correction means, thus providing the correction means with an acceleration error signal which can then be used to directly effect the required correctional acceleration of the mask table.

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