公开(公告)号：NL2003638A

公开(公告)日：2010-06-07

申请号：NL2003638

申请日：2009-10-14

Applicant: ASML NETHERLANDS BV

Inventor： MULKENS JOHANNES ,  KATE NICOLAAS

IPC: G03F7/20

Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.

公开(公告)号：NL2003363A

公开(公告)日：2010-03-15

申请号：NL2003363

申请日：2009-08-20

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KATE NICOLAAS ,  GRAAF SANDRA ,  CASTELIJNS HENRICUS

IPC: G03F7/20

公开(公告)号：NL2003226A

公开(公告)日：2010-03-09

申请号：NL2003226

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  ANTONEVICI ANCA ,  KATE NICOLAAS ,  OTTENS JOOST ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES

IPC: G03F7/20

公开(公告)号：NL2010965A

公开(公告)日：2013-12-24

申请号：NL2010965

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  JANSEN HANS ,  KATE NICOLAAS ,  PAULUSSEN DENNIS ,  SCHIMMEL HENDRIKUS ,  LABETSKI DZMITRY ,  CASTELIJNS HENRICUS ,  MESTROM WILBERT ,  BADIE RAMIN ,  KAMPINGA WIM ,  NIEUWENKAMP JAN ,  BRINKERT JACOB ,  VIRGO BRAIN ,  JILISEN REINIER ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  PUTTEN PETER ,  STRAATEN GERRIT

IPC: H01L21/02

公开(公告)号：NL2007802A

公开(公告)日：2012-06-25

申请号：NL2007802

申请日：2011-11-17

Applicant: ASML NETHERLANDS BV

Inventor： KATE NICOLAAS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  H01L21/68

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：NL2005208A

公开(公告)日：2011-03-29

申请号：NL2005208

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES ,  PATEL HRISHIKESH

IPC: G03F7/20

公开(公告)号：NL2005126A

公开(公告)日：2011-03-22

申请号：NL2005126

申请日：2010-07-22

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS

IPC: G03F7/20

公开(公告)号：NL2005120A

公开(公告)日：2011-03-22

申请号：NL2005120

申请日：2010-07-21

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  CASTELIJNS HENRICUS ,  BOKHOVEN LAURENTIUS

IPC: G03F7/20

Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.

公开(公告)号：NL2003820A

公开(公告)日：2010-06-23

申请号：NL2003820

申请日：2009-11-18

Applicant: ASML NETHERLANDS BV

Inventor： KATE NICOLAAS

IPC: G03F7/20

Abstract: A fluid handling structure comprising a conduit is described. The conduit is configured to supply fluid to (i) a space between a projection system and a substrate and/or substrate table, and/or (ii) a top surface of a substrate and/or substrate table radially outward of the space. The fluid comprises a fluid in a first phase and a fluid in a second phase. The conduit comprises at least two openings, a first phase fluid opening configured to allow passage of the first phase fluid and a second phase fluid opening configured to allow passage of the second phase fluid. There is also disclosed a table and a lithographic apparatus comprising such a conduit, as well as a method in which the conduit is used.

公开(公告)号：NL2010817A

公开(公告)日：2013-12-02

申请号：NL2010817

申请日：2013-05-17

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  FIEN MENNO ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KOEVOETS ADRIANUS HENDRIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  OVERKAMP JIM VINCENT ,  KATE NICOLAAS ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  BEIJNUM MAARTEN ,  JONG ROB

IPC: G03F7/20 ,  H01L21/683

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.