公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

公开(公告)号：NL2011663A

公开(公告)日：2014-05-19

申请号：NL2011663

申请日：2013-10-23

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  RIEPEN MICHEL ,  JILISEN REINIER ,  GRAAF DENNIS

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

公开(公告)号：NL2008980A

公开(公告)日：2013-01-14

申请号：NL2008980

申请日：2012-06-12

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  KATE NICOLAAS ,  ROSET NIEK ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS ,  ROPS CORNELIUS ,  OVERKAMP JIM

IPC: G03F7/20

公开(公告)号：NL2008979A

公开(公告)日：2013-01-14

申请号：NL2008979

申请日：2012-06-12

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  RIEPEN MICHEL ,  ROPS CORNELIUS

IPC: G03F7/20

公开(公告)号：NL2006506A

公开(公告)日：2011-10-31

申请号：NL2006506

申请日：2011-03-31

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  JACOBS JOHANNES ,  RIEPEN MICHEL ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2006076A

公开(公告)日：2011-09-06

申请号：NL2006076

申请日：2011-01-27

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  RIEPEN MICHEL ,  CORTIE ROGIER ,  MEIJERS RALPH ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：DE602006019478D1

公开(公告)日：2011-02-17

申请号：DE602006019478

申请日：2006-11-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ,  SMEULERS JOHANNES PETRUS ,  BECKERS MARCEL ,  SHULEPOV SERGEL ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE602006009174D1

公开(公告)日：2009-10-29

申请号：DE602006009174

申请日：2006-04-26

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERICK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE102006042987A1

公开(公告)日：2008-04-03

申请号：DE102006042987

申请日：2006-09-13

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： EHM DIRK HEINRICH ,  RUNSTRAAT ANNEMIEKE VAN DE ,  WOLSCHRIJN BASTIAAN THEODOOR ,  STORM ARNOLD ,  STEIN THOMAS ,  MEIJERINK MARCO G H ,  BASTEIN TON ,  SOEST-VERCAMMEN ESTHER L J ,  KOSTER NORBERTUS BENEDICTUS ,  GUBBELS FRITS G H M ,  OPREL PETER J ,  NIENOORD MICHIEL ,  RIEPEN MICHEL ,  MOORS ROEL JOHANNES HUBERTUS J

IPC: G03F7/20

Abstract: The method involves heating a reflective optical element (1) within the range of a catalytic top layer (4) on approximately one hundred fifty degree celsius and more, and supplying molecular hydrogen in the range of the catalytic top layer. The reflective optical element is heated on approximately one hundred seventy degree, particularly approximately two hundred degree celsius and more. The both steps are carried out during the operation of the reflective optical element. Independent claims are also included for the following: (1) a reflective optical element for the soft X-ray and extreme ultraviolet wavelength range, particularly for an extreme ultraviolet lithography device, which has an optically active coating on a substrate (2) an arrangement of two or multiple reflective optical elements, which has an optically active coating on a substrate (3) a projection system, particularly for an extreme ultraviolet lithography device, which has a reflective optical element (4) an exposure system, particularly for an extreme ultraviolet lithography device, which has a reflective optical element (5) an extreme ultraviolet lithography device, which has a reflective optical element and a hydrogen inlet.

公开(公告)号：NL2006272A

公开(公告)日：2011-11-07

申请号：NL2006272

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： HAM RONALD ,  BARAGONA MARCO ,  GROEN ROBERTUS ,  MAESSEN RALPH ,  TOONDER JACOB ,  KOVACEVIC-MILIVOJEVIC MILICA ,  LEENDERS MARTINUS ,  MULKENS JOHANNES ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  CROMWIJK JAN ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20