公开(公告)号：NL2009210A

公开(公告)日：2013-02-19

申请号：NL2009210

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  BLEEKER ARNO ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  VERMEULEN JOHANNES ,  WUISTER SANDER

IPC: G03F7/20

公开(公告)号：NL2008500A

公开(公告)日：2012-10-23

申请号：NL2008500

申请日：2012-03-16

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  HOEKS MARTINUS ,  CADEE THEODORUS

IPC: G03F7/20

Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

公开(公告)号：SG178368A1

公开(公告)日：2012-04-27

申请号：SG2012009551

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  DEN BOEF ARIE ,  COENE WILLEM ,  BLEEKER ARNO ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：DE60335349D1

公开(公告)日：2011-01-27

申请号：DE60335349

申请日：2003-03-19

Applicant: MICRONIC LASER SYSTEMS AB ,  ASML NETHERLANDS BV

Inventor： THUREN ANDERS ,  VAN DER MAST KAREL ,  BLEEKER ARNO

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

公开(公告)号：NL2009902A

公开(公告)日：2013-07-01

申请号：NL2009902

申请日：2012-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BLEEKER ARNO ,  HENNUS PIETER ,  HOEKS MARTINUS ,  HOL SVEN ANTOIN JOHAN ,  SCHOOT HARMEN ,  SLAGHEKKE BERNARDUS ,  TINNEMANS PATRICIUS ,  WIJST MARC ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  BEERENS RUUD ,  FISCHER OLOF ,  AANGENENT WOUTER ,  BOSCH NIELS JOHANNES MARIA

IPC: G03F7/20

公开(公告)号：NL2007765A

公开(公告)日：2012-05-15

申请号：NL2007765

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  COENE WILLEM ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G03F7/20

公开(公告)号：AT491972T

公开(公告)日：2011-01-15

申请号：AT03745053

申请日：2003-03-19

Applicant: MICRONIC LASER SYSTEMS AB ,  ASML NETHERLANDS BV

Inventor： THUREN ANDERS ,  VAN DER MAST KAREL ,  BLEEKER ARNO

IPC: G03F7/20 ,  H01L21/027

Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.

公开(公告)号：NL2009806A

公开(公告)日：2013-06-10

申请号：NL2009806

申请日：2012-11-14

Applicant: ASML NETHERLANDS BV

Inventor： DIJSSELDONK ANTONIUS ,  BLEEKER ARNO

IPC: G03F7/20

公开(公告)号：NL2009239A

公开(公告)日：2013-03-04

申请号：NL2009239

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BLEEKER ARNO ,  BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20