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11.发明专利
公开(公告)号：NL2013828A
公开(公告)日：2015-06-26
申请号：NL2013828
申请日：2014-11-19
Applicant: ASML NETHERLANDS BV
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12.发明专利
公开(公告)号：SG188036A1
公开(公告)日：2013-03-28
申请号：SG2012052569
申请日：2012-07-17
Applicant: ASML NETHERLANDS BV
Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS , JACOBS JOHANNES HENRICUS WILHELMUS , VERSPAGET COEN CORNELIS WILHELMUS , VAN DER HAM RONALD , THOMAS IVO ADAM JOHANNES , HOUBEN MARTIJN , LAURENT THIBAULT SIMON MATHIEU , CORCORAN GREGORY MARTIN MASON , BLOKS RUUD HENDRIKUS MARTINUS JOHANNES , PIETERSE GERBEN , GUNTER PIETER LEIN JOSEPH , REMIE MARINUS JAN , DERKS SANDER CATHARINA REINIER
Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)
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公开(公告)号：NL2006536A
公开(公告)日：2011-11-15
申请号：NL2006536
申请日：2011-04-04
Applicant: ASML NETHERLANDS BV
Inventor： LAFARRE RAYMOND , ROSET NIEK , HOUBEN MARTIJN
Abstract: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided that is configured to apply a variable bending force to the edge of the substrate in a second direction, which second direction has at least a component opposite in direction to the first direction.
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公开(公告)号：NL2005478A
公开(公告)日：2011-05-18
申请号：NL2005478
申请日：2010-10-07
Applicant: ASML NETHERLANDS BV
Inventor： DZIOMKINA NINA , KRUIJF NIEK , GRAAF ROELOF , KERKHOF MARCUS , LEENDERS MARTINUS , LIEBREGTS PAULUS , ROOIJ GERARDUS , HOUBEN MARTIJN , BADAM VIJAY , SONDAG-HUETHORST JEANNET
IPC: G03F7/20
Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
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公开(公告)号：NL2003577A
公开(公告)日：2010-05-04
申请号：NL2003577
申请日：2009-09-30
Applicant: ASML NETHERLANDS BV
Inventor： COMPEN RENE , NUNEN GERARDUS , HOUBEN MARTIJN , HEUVEL MARCO
IPC: G03F7/20
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Patent Agency Ranking
公开(公告)号：NL2005479A
公开(公告)日：2011-05-18
申请号：NL2005479
申请日：2010-10-07
Applicant: ASML NETHERLANDS BV
Inventor： GRAAF ROELOF , DZIOMKINA NINA , KERKHOF MARCUS , LEENDERS MARTINUS , LIEBREGTS PAULUS , ROOIJ GERARDUS , HOUBEN MARTIJN , BADAM VIJAY , SONDAG-HUETHORST JEANNET , KRUIJF NIEK
IPC: G03F7/20
Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
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公开(公告)号：SG162667A1
公开(公告)日：2010-07-29
申请号：SG2009079914
申请日：2009-12-01
Applicant: ASML NETHERLANDS BV
Inventor： HOUBEN MARTIJN
Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table. The gap size is reduced using an edge member which may be, for example, a ring known as a BES (Bubble Extraction System) ring. Information regarding the shape and/or cross-sectional dimension (e.g., diameter) of the substrate, or information regarding the size of the gap, is transmitted to a controller that controls the edge member in order for the edge member, for example, to be reduced to an appropriate size to reduce the gap as much as possible, desirably without compressing the edge of the substrate. Alternatively or additionally, the gap may be reduced by moving the substrate and/or edge member adjacent the edge of a surface of the substrate table. [Figure 17]
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18.发明专利
公开(公告)号：NL2013405A
公开(公告)日：2015-03-30
申请号：NL2013405
申请日：2014-09-03
Applicant: ASML NETHERLANDS BV
Inventor： HOUBEN MARTIJN , KOCK ALWIN , ABEELEN HENDRIKUS JOHANNES MARINUS , HEUVEL MARCO ADRIANUS PETER
IPC: G03F7/20 , H01L21/683
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公开(公告)号：NL2010817A
公开(公告)日：2013-12-02
申请号：NL2010817
申请日：2013-05-17
Applicant: ASML NETHERLANDS BV
Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS , FIEN MENNO , HOOGENDAM CHRISTIAAN ALEXANDER , HOUBEN MARTIJN , JACOBS JOHANNES HENRICUS WILHELMUS , KOEVOETS ADRIANUS HENDRIK , LAFARRE RAYMOND WILHELMUS LOUIS , OVERKAMP JIM VINCENT , KATE NICOLAAS , WESTERLAKEN JAN STEVEN CHRISTIAAN , GROOT ANTONIUS FRANCISCUS JOHANNES , BEIJNUM MAARTEN , JONG ROB
IPC: G03F7/20 , H01L21/683
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：NL2003470A
公开(公告)日：2010-04-08
申请号：NL2003470
申请日：2009-09-11
Applicant: ASML NETHERLANDS BV
Inventor： COMPEN RENE , LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS , VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS , JEUNINK ANDRE , LOOPSTRA ERIK , OTTENS JOOST , SMITS PETER , ABEELEN HENDRIKUS , MEULENDIJKS ANTONIUS , HOUBEN MARTIJN
IPC: G03F7/20
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