公开(公告)号：CA3066546A1

公开(公告)日：2018-12-20

申请号：CA3066546

申请日：2018-06-08

Applicant: ASML NETHERLANDS BV

Inventor： VLES DAVID FERDINAND ,  ANDE CHAITANYA KRISHNA ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  JANSSEN JOHANNES JOSEPH ,  JANSSEN PAUL ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  MEIJER MARCEL PETER ,  MEIJERINK WOUTER ROGIER ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  OLSMAN RAYMOND ,  PATEL HRISHIKESH ,  PETER MARIA ,  VAN DEN BOSCH GERRIT ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VOORTHUIJZEN WILLEM-PIETER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEXANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：CA3008939A1

公开(公告)日：2017-06-22

申请号：CA3008939

申请日：2016-12-02

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  KLOOTWIJK JOHAN HENDRIK ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  ZDRAVKOV ALEXANDAR NIKOLOV

IPC: G03F7/20 ,  G03F1/62 ,  G03F1/64

Abstract: Methods of manufacturing a membrane assembly are disclosed. In one arrangement, a stack comprises a planar substrate and at least one membrane layer. The planar substrate comprises an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are selectively removed. The membrane assembly after removal comprises: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region of the planar substrate, an edge section around the border, the edge section formed from the edge region of the planar substrate, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region of the planar substrate. The method further comprises separating the edge section from the border by cutting or breaking the bridge.

公开(公告)号：CA3148137A1

公开(公告)日：2021-02-04

申请号：CA3148137

申请日：2020-07-24

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  BIRON MAXIME ,  DONMEZ NOYAN INCI ,  FERRE LLIN LOURDES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KUNTZEL JAN HENDRIK WILLEM ,  NOTENBOOM ARNOUD WILLEM ,  ROLLIER ANNE-SOPHIE ,  VAN DER WOORD TIES WOUTER ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.

公开(公告)号：CA3099013A1

公开(公告)日：2019-11-07

申请号：CA3099013

申请日：2019-04-12

Applicant: ASML NETHERLANDS BV

Inventor： DE GRAAF DENNIS ,  BEAUDRY RICHARD ,  BIRON MAXIME ,  JANSSEN PAUL ,  KATER THIJS ,  KORNELSEN KEVIN ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  KUNTZEL JAN HENDRIK WILLEM ,  MARTEL STEPHANE ,  NASALEVICH MAXIM ALEKSANDROVICH ,  SALMASO GUIDO ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62 ,  G03F7/20

Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.

公开(公告)号：CA3021916A1

公开(公告)日：2017-11-02

申请号：CA3021916

申请日：2017-04-12

Applicant: ASML NETHERLANDS BV

Inventor： NASALEVICH MAXIM ALEKSANDROVICH ,  ABEGG ERIK ACHILLES ,  BANERJEE NIRUPAM ,  BLAUW MICHIEL ALEXANDER ,  BROUNS DERK SERVATIUS GERTRUDA ,  JANSSEN PAUL ,  KRUIZINGA MATTHIAS ,  LENDERINK EGBERT ,  MAXIM NICOLAE ,  NIKIPELOV ANDREY ,  NOTENBOOM ARNOUD WILLEM ,  PILIEGO CLAUDIA ,  PETER MARIA ,  RISPENS GIJSBERT ,  SCHUH NADJA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBURG ANTONIUS WILLEM ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID ,  VOORTHUIJZEN WILLEM-PIETER ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：CA3008474A1

公开(公告)日：2017-06-22

申请号：CA3008474

申请日：2016-12-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  DE GRAAF DENNIS ,  JANSSEN PAUL ,  PETER MARIA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER ZANDE WILLEM JOAN ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F1/24 ,  G03F1/62 ,  G03F7/20

Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine

公开(公告)号：CA2997135A1

公开(公告)日：2017-03-09

申请号：CA2997135

申请日：2016-08-26

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  CASIMIRI ERIC WILLEM FELIX ,  DRUZHININA TAMARA ,  JANSSEN PAUL ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  OOSTERHOFF SICCO ,  PETER MARIA ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F1/62

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

公开(公告)号：CA2968151A1

公开(公告)日：2016-05-26

申请号：CA2968151

申请日：2015-11-16

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： KRUIZINGA MATTHIAS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BOGAART ERIK WILLEM ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  BRULS RICHARD JOSEPH ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KAMALI MOHAMMAD REZA ,  KRAMER RONALD HARM GUNTHER ,  LANSBERGEN ROBERT GABRIEL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIPSON MATTHEW ,  LOOPSTRA ERIK ROELOF ,  LYONS JOSEPH H ,  ROUX STEPHEN ,  VAN DEN BOSCH GERRIT ,  VAN DEN HEIJKANT SANDER ,  VAN DER GRAAF SANDRA ,  VAN DER MEULEN FRITS ,  VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.