公开(公告)号：NL1036709A1

公开(公告)日：2009-10-27

申请号：NL1036709

申请日：2009-03-13

Applicant: ASML NETHERLANDS BV

Inventor： WATSO ROBERT DOUGLAS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STEIJAERT PETER PAUL ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  WINKEL JIMMY MATHEUS WILHELMUS ,  SENA JOAO PAULO DA PAZ ,  LEE MAURICE MARTINUS JOHANNES ,  LIER HENRICUS MARTINUS DOROTHE ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：SG149783A1

公开(公告)日：2009-02-27

申请号：SG2008054611

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

Abstract: Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]

公开(公告)号：NL1035712A1

公开(公告)日：2009-01-27

申请号：NL1035712

申请日：2008-07-17

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  CROMWIJK JAN WILLEM ,  LAURSEN THOMAS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG125208A1

公开(公告)日：2006-09-29

申请号：SG200600932

申请日：2006-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

公开(公告)号：NL2010965A

公开(公告)日：2013-12-24

申请号：NL2010965

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  JANSEN HANS ,  KATE NICOLAAS ,  PAULUSSEN DENNIS ,  SCHIMMEL HENDRIKUS ,  LABETSKI DZMITRY ,  CASTELIJNS HENRICUS ,  MESTROM WILBERT ,  BADIE RAMIN ,  KAMPINGA WIM ,  NIEUWENKAMP JAN ,  BRINKERT JACOB ,  VIRGO BRAIN ,  JILISEN REINIER ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  PUTTEN PETER ,  STRAATEN GERRIT

IPC: H01L21/02

公开(公告)号：DE602004032091D1

公开(公告)日：2011-05-19

申请号：DE602004032091

申请日：2004-07-12

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：DE602005020893D1

公开(公告)日：2010-06-10

申请号：DE602005020893

申请日：2005-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER TOORN JAN-GERARD CORNE

IPC: G03F7/20

Abstract: The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

公开(公告)号：NL2003392A

公开(公告)日：2010-03-18

申请号：NL2003392

申请日：2009-08-25

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  MEESTER ARNOUT ,  THOMAS IVO ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：NL1035725A1

公开(公告)日：2009-01-27

申请号：NL1035725

申请日：2008-07-18

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  NET ANTONIUS JOHANNUS VAN DER ,  WANTEN PETER FRANCISCUS ,  DONCK JACQUES COR JOHAN VAN DER ,  WATSO ROBERT DOUGLAS ,  DOOL TEUNIS CORNELIS VAN DEN ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG147422A1

公开(公告)日：2008-11-28

申请号：SG2008075251

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

Abstract: Lithographic Apparatus and Device Manufacturing Method An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.