公开(公告)号：NL2013014A

公开(公告)日：2014-12-22

申请号：NL2013014

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: G03F7/20

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：NL2011533A

公开(公告)日：2014-05-06

申请号：NL2011533

申请日：2013-10-01

Applicant: ASML NETHERLANDS BV

Inventor： GREEVENBROEK HENDRIKUS ,  BADIE RAMIN ,  BANINE VADIM ,  DIJKSMAN JOHAN ,  KEMPEN ANTONIUS ,  YAKUNIN ANDREI ,  WINKELS KOEN GERHARDUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2011772A

公开(公告)日：2014-01-13

申请号：NL2011772

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BENSCHOP JOZEF ,  MOORS JOHANNES

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009210A

公开(公告)日：2013-02-19

申请号：NL2009210

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  BLEEKER ARNO ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  VERMEULEN JOHANNES ,  WUISTER SANDER

IPC: G03F7/20

公开(公告)号：SG186072A1

公开(公告)日：2013-01-30

申请号：SG2012086955

申请日：2011-03-17

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  VAN DER SCHOOT HARMEN ,  STEVENS LUCAS ,  VAN KAMPEN MAARTEN

IPC: G03F1/24 ,  G03F1/62

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.

公开(公告)号：SG183528A1

公开(公告)日：2012-10-30

申请号：SG2012063822

申请日：2011-02-03

Applicant: ASML NETHERLANDS BV

Inventor： MEDVEDEV VIACHESLAV ,  BANINE VADIM ,  KRIVTSUN VLADIMIR ,  SOER WOUTER ,  YAKUNIN ANDREI

Abstract: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.

公开(公告)号：NL2008426A

公开(公告)日：2012-10-09

申请号：NL2008426

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G03F7/20

公开(公告)号：NL2007160A

公开(公告)日：2012-02-28

申请号：NL2007160

申请日：2011-07-21

Applicant: ASML NETHERLANDS BV

Inventor： MARK MARTINUS ,  MAUCZOK RUEDIGER ,  GIESBERS JACOBUS ,  BANINE VADIM ,  JEUNINK ANDRE ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KLOOTWIJK JOHAN ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS

IPC: G03F7/00

公开(公告)号：NL2005956A

公开(公告)日：2011-08-29

申请号：NL2005956

申请日：2011-01-06

Applicant: ASML NETHERLANDS BV

Inventor： KOOLE ROELOF ,  BANINE VADIM ,  WUISTER SANDER ,  PEETERS EMIEL

IPC: G03F7/20

公开(公告)号：NL2004735A

公开(公告)日：2011-01-10

申请号：NL2004735

申请日：2010-05-18

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  KOEVOETS ADRIANUS ,  SCHIFFART CATHARINUS ,  BANINE VADIM ,  BOEF ARIE ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  SCHOTHORST GERARD ,  DIJKSMAN JOHAN ,  SCHOORMANS CAROLUS ,  WUISTER SANDER

IPC: G03F7/00