公开(公告)号：SG109609A1

公开(公告)日：2005-03-30

申请号：SG200405049

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

公开(公告)号：SG108997A1

公开(公告)日：2005-02-28

申请号：SG200404366

申请日：2004-07-22

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

公开(公告)号：NL1036273A1

公开(公告)日：2009-06-19

申请号：NL1036273

申请日：2008-12-03

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS MARTINUS CORNELIS ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  DONCK JACQUES COR JOHAN VAN DE ,  DOOL TEUNIS CORNELIS VAN DEN ,  OOSTERHUIS GERRIT

IPC: G03F7/20

公开(公告)号：SG144150A1

公开(公告)日：2008-07-29

申请号：SG2008044380

申请日：2005-12-06

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER TOORN JAN-GERARD CORNE

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

公开(公告)号：DE602006000372D1

公开(公告)日：2008-02-14

申请号：DE602006000372

申请日：2006-02-13

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: G03F7/20

公开(公告)号：SG126922A1

公开(公告)日：2006-11-29

申请号：SG200602941

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKER BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF DE ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS A ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA ,  TOORN VAN DER JAN-GERARD C ,  RIEPEN MICHEL

公开(公告)号：DE602004029970D1

公开(公告)日：2010-12-23

申请号：DE602004029970

申请日：2004-08-25

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODORE MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  SEUNTIENS-GRUDA LEJLA

IPC: G03F7/20 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  H01L21/027

公开(公告)号：NL2003395A

公开(公告)日：2010-03-18

申请号：NL2003395

申请日：2009-08-26

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  LEE MAURICE ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  JORRITSMA LAURENTIUS ,  MEESTER ARNOUT ,  JANSEN BAUKE ,  THOMAS IVO ,  MIRANDA MARCIO

IPC: G03F7/20

公开(公告)号：DE602006009174D1

公开(公告)日：2009-10-29

申请号：DE602006009174

申请日：2006-04-26

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERICK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: G03F7/20