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    Lithographic apparatus and device manufacturing method
    11.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009105469A

    公开(公告)日：2009-05-14

    申请号：JP2009033850

    申请日：2009-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which the generation of bubbles in immersion liquid is reduced. SOLUTION: The immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure has a buffer surface, and the buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, is normally full of the immersion liquid to achieve rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中，限制结构具有缓冲表面，并且当使用时，缓冲表面， 被定位在靠近基本上包括衬底的上表面的平面和保持衬底的衬底台上，以限定具有流动阻力的通道。 在缓冲表面设置有凹部，当使用时，凹部通常充满浸没液体，以在间隙在缓冲表面下移动时实现快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and method for manufacturing device
    12.
    发明专利
    Lithography equipment and method for manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2006093709A

    公开(公告)日：2006-04-06

    申请号：JP2005275937

    申请日：2005-09-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment in which the generation of air bubbles in an immersion liquid is reduced. SOLUTION: Immersion lithography projection equipment has a liquid-confining structure configured so as to confine liquid at least partially in a space between a projection system and a substrate. The confining structure has a buffering plane which is arranged when in use, very close to the a plane substantially including the substrate and the top surface of a substrate table that holds the substrate, and defines a path having flow resistance. In this buffering plane, recesses are formed and normally filled with liquid when in use so that a gap is rapidly filled therewith when the gap between the substrate and the substrate table moves under the buffering plane. The recess may be formed into an annular or a radial shape so that a plurality of recesses can be arranged. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供浸没式光刻设备，其中浸没液体中的气泡的产生减少。 浸渍光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中。 约束结构具有缓冲平面，该平面在使用时非常接近于基本上包括基板的平面和保持基板的基板台的顶表面，并且限定具有流动阻力的路径。 在该缓冲面中，当使用时形成凹部，并且通常在液体中充满液体，使得当基板和基板台之间的间隙在缓冲平面下移动时，间隙迅速填充。 凹部可以形成为环形或径向形状，使得可以布置多个凹部。 版权所有（C）2006，JPO＆NCIPI

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