公开(公告)号：DE60225216D1

公开(公告)日：2008-04-10

申请号：DE60225216

申请日：2002-09-06

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LOOPSTRA ERIK ROELOF ,  GILISSEN NOUD JAN ,  EURLINGS MARKUS F A

IPC: G03F7/20 ,  G21K1/04 ,  G21K5/02 ,  H01L21/027

Abstract: An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.

公开(公告)号：SG135931A1

公开(公告)日：2007-10-29

申请号：SG2003068699

申请日：2003-11-24

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG

Inventor： LOWISCH MARTIN ,  DIERICHS MARCEL MATHIJS THEODO ,  VAN INGEN SCHENAU KOEN ,  VAN DER LAAN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MCGOO ELAINE ,  MICKAN UWE

IPC: G03F1/24 ,  G03F7/20 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027 ,  G03F1/14

Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.

公开(公告)号：SG132647A1

公开(公告)日：2007-06-28

申请号：SG2006081707

申请日：2006-11-23

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS HERNES ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：SG128601A1

公开(公告)日：2007-01-30

申请号：SG200604016

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS RUDOLF ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  ES VAN JOHANNES

公开(公告)号：DE60118669D1

公开(公告)日：2006-05-24

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

公开(公告)号：SG115668A1

公开(公告)日：2005-10-28

申请号：SG200401976

申请日：2004-04-08

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  COX HENRIKUS HERMAN MARIE ,  LEVASIER LEON MARTIN

IPC: G02F1/13 ,  F16F15/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

公开(公告)号：DE60321883D1

公开(公告)日：2008-08-14

申请号：DE60321883

申请日：2003-11-25

Applicant: ASML NETHERLANDS BV

Inventor： LOWISCH MARTIN ,  DIERICHS MARCEL MATHIJS THEODO ,  VAN INGEN SCHENAU KOEN ,  VAN DER LAAN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MCGOO ELAINE ,  MICKAN UWE

IPC: G03F7/20 ,  G03F1/24 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027

Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z 5 astigmatism, Z 9 spherical, and Z 12 astigmatism.

公开(公告)号：DE60227304D1

公开(公告)日：2008-08-14

申请号：DE60227304

申请日：2002-01-08

Applicant: ASML NETHERLANDS BV

Inventor： KOSTER NORBERTUS BENEDICTUS ,  MERTENS BASTIAAN MATTHIAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  IVANOV VLADIMIR VITAL EVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH

IPC: G03F7/20 ,  B03C3/38 ,  H01J27/02 ,  H01J37/08 ,  H01L21/027

Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

公开(公告)号：SG139554A1

公开(公告)日：2008-02-29

申请号：SG2006026827

申请日：2003-12-18

Applicant: ASML NETHERLANDS BV

Inventor： STEVENS LUCAS HENRICUS JOHANNE ,  LEENDERS MARTINUS HENDRIKUS AN ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: B08B7/00 ,  G03F7/20 ,  H01L21/027

Abstract: Lithographic Apparatus, Device Manufacturing Method, and Device Manufactured Thereby. Various novel cleaning processes are disclosed. Previous cleaning processes are global in that they involve infusing oxygen into the whole system and switching on a single radiation source which supplies a cleaning beam of radiation to every optical element in the lithographic apparatus. This can lead to overexposure of some optical elements whilst leaving other optical elements not cleaned to a sufficient amount. This is overcome by providing a system which allows selective ones or groups of the optical elements to be cleaned and which allows a spatially varied cleaning to occur across the surface of an optical element. This can be achieved by only supplying the cleaning beam of radiation to one or some of the optical elements and/or by increasing the local oxygen density in the vicinity of certain optical elements. Spatially resolved cleaning can be achieved using gray filters, which may be dynamically adapted, or by using a steerable electron mean beam.

公开(公告)号：SG137811A1

公开(公告)日：2007-12-28

申请号：SG2007036841

申请日：2007-05-21

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHEMUS JAC ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.