公开(公告)号：SG132647A1

公开(公告)日：2007-06-28

申请号：SG2006081707

申请日：2006-11-23

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS HERNES ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：SG128649A1

公开(公告)日：2007-01-30

申请号：SG200604387

申请日：2006-06-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  SHULEPOV SERGEI

公开(公告)号：SG121969A1

公开(公告)日：2006-05-26

申请号：SG200506523

申请日：2005-10-13

Applicant: ASML NETHERLANDS BV

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF DE ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  NET VAN DER ANTONIUS JOHANNES ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  GOMPEL VAN EDWIN AUGUSTINUS MA

公开(公告)号：SG121820A1

公开(公告)日：2006-05-26

申请号：SG200306760

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： DERKSEN ANTONIUS THEODORUS ANN ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOF JOERI ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

公开(公告)号：SG121819A1

公开(公告)日：2006-05-26

申请号：SG200306759

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGEDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK VAN FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  SMIT DE JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  SANTEN VAN HELMAR

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：DE60118669D1

公开(公告)日：2006-05-24

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

公开(公告)号：SG120267A1

公开(公告)日：2006-03-28

申请号：SG200505158

申请日：2005-08-12

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  TEUNISSE FRANCISCUS JOHANNES H ,  VAN DER TOORN JAN-GERARD CORNE ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA

公开(公告)号：NL1036186A1

公开(公告)日：2009-06-04

申请号：NL1036186

申请日：2008-11-12

Applicant: ASML NETHERLANDS BV

Inventor： KROONEN ROGER JOHANNES MARIA HUBERTUS ,  CORNELISSEN SEBASTIAAN MARIA JOHANNES ,  DONDERS SJOERD NICOLAAS LAMBER ,  KATE NICOLAAS TEN ,  HAM RONALD VAN DER ,  ROSET NIEK JACOBUS JOHANNES ,  JACOBS FRANCISCUS MATHIJS ,  RIEPEN MICHEL ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS ,  ROOS REINDER WIETSE ,  HOGELAND MATTIJS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：DE60036844T2

公开(公告)日：2008-07-31

申请号：DE60036844

申请日：2000-11-16

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBER ,  VAN EMPEL TJARKO ADRIAAN RUDOL

IPC: G03F7/20 ,  H01L21/027

Abstract: An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but without deforming the mask 10.

公开(公告)号：SG143284A1

公开(公告)日：2008-06-27

申请号：SG2008042236

申请日：2005-11-30

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.