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公开(公告)号：SG147422A1
公开(公告)日：2008-11-28
申请号：SG2008075251
申请日：2006-05-02
Applicant: ASML NETHERLANDS BV
Inventor： STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBERTUS , DE GRAAF ROELOF FREDERIK , HOOGENDAM CHRISTIAAN ALEXANDER , JANSEN HANS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIEBREGTS PAULUS MARTINUS MARIA , MERTENS JEROEN JOHANNES SOPHIA MARIA , VAN DER TOORN JAN-GERARD CORNELIS , RIEPEN MICHEL
Abstract: Lithographic Apparatus and Device Manufacturing Method An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：SG126920A1
公开(公告)日：2006-11-29
申请号：SG200602939
申请日：2006-05-02
Applicant: ASML NETHERLANDS BV
Inventor： STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBERTUS , GRAAF DE ROELOF FREDERICK , HOOGENDAM CHRISTIAAN ALEXANDER , LEENDERS MARTINUS HENDRIKUS A , MERTENS JEROEN JOHANNES SOPHIA M , RIEPEN MICHEL
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps (22,25) in the substrate table (WT) by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. The apparatus comprises a device (32) configured to extract liquid, gas or both from the gap. The device configured to extract liquid, gas or both comprises a membrane configured to allow gas but not liquid to be extracted from the gap.
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公开(公告)号：SG185191A1
公开(公告)日：2012-11-29
申请号：SG2012020897
申请日：2012-03-22
Applicant: ASML NETHERLANDS BV
Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS , BANINE VADIM YEVGENYEVICH , MOORS JOHANNES HUBERTUS JOSEPHINA , VERHAGEN MARTINUS CORNELIS MARIA , FRIJNS OLAV WALDEMAR VLADIMIR , VAN DONK GERRIT , VAN GERNER HENK JAN
Abstract: A two-phase thermal conditioning system for thermal conditioning a part of a lithographic apparatus, includes an evaporator to be positioned in thermal contact with the part of the lithographic apparatus for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser to be positioned at a distance from the part of the lithographic apparatus for removing heat from the fluid inside the condenser by condensation of the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a circuit in which fluid is able to flow; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator configured to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor configured to provide a measurement signal representative of the temperature of the fluid; and a controller configured to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger from or to fluid inside the accumulator based on the measurement signal.(Figure 2)
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公开(公告)号：SG153763A1
公开(公告)日：2009-07-29
申请号：SG2008092165
申请日：2008-12-10
Applicant: ASML NETHERLANDS BV
Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAN WAGNER , CORTIE ROGIER HENDRIKUS MAGDALENA
Abstract: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. [Fig. 6B]
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公开(公告)号：NL1036211A1
公开(公告)日：2009-06-04
申请号：NL1036211
申请日：2008-11-18
Applicant: ASML NETHERLANDS BV
Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS , KATE NICOLAAS TEN , STEVENS LUCAS HENRICUS JOHANNES , HAM RONALD VAN DER , RIEPEN MICHEL
IPC: G03F7/20 , H01L21/027
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Patent Agency Ranking
公开(公告)号：NL2010817A
公开(公告)日：2013-12-02
申请号：NL2010817
申请日：2013-05-17
Applicant: ASML NETHERLANDS BV
Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS , FIEN MENNO , HOOGENDAM CHRISTIAAN ALEXANDER , HOUBEN MARTIJN , JACOBS JOHANNES HENRICUS WILHELMUS , KOEVOETS ADRIANUS HENDRIK , LAFARRE RAYMOND WILHELMUS LOUIS , OVERKAMP JIM VINCENT , KATE NICOLAAS , WESTERLAKEN JAN STEVEN CHRISTIAAN , GROOT ANTONIUS FRANCISCUS JOHANNES , BEIJNUM MAARTEN , JONG ROB
IPC: G03F7/20 , H01L21/683
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：DE60335595D1
公开(公告)日：2011-02-17
申请号：DE60335595
申请日：2003-11-10
Applicant: ASML NETHERLANDS BV
Inventor： LOF JOERI , DERKSEN ANTONIUS THEODORUS ANNA MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , LOOPSTRA ERIK ROELOF , MULKENS JOHANNES CATHARINUS HUBERTUS , STRAAIJER ALEXANDER , STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBERTUS , MERTENS JEROEN JOHANNES SOPHIA MARIA , SENGERS TIMOTHEUS FRANCISCUS
IPC: G03F7/20 , G03F9/00 , H01L21/027
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公开(公告)号：SG171645A1
公开(公告)日：2011-06-29
申请号：SG2011031119
申请日：2006-04-03
Applicant: ASML NETHERLANDS BV
Inventor： BECKERS MARCEL , DONDERS SJOERD NICOLAAS LAMBERTUS , HOOGENDAM CHRISTIAAN ALEXANDER , JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , KEMPER NICOLAAS RUDOLF , MIGCHELBRINK FERDY , EVERS ELMAR
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]
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公开(公告)号：DE602004029970D1
公开(公告)日：2010-12-23
申请号：DE602004029970
申请日：2004-08-25
Applicant: ASML NETHERLANDS BV
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