公开(公告)号：NL2005655A

公开(公告)日：2011-06-14

申请号：NL2005655

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： ROPS CORNELIUS ,  KEMPER NICOLAAS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：NL1036186A1

公开(公告)日：2009-06-04

申请号：NL1036186

申请日：2008-11-12

Applicant: ASML NETHERLANDS BV

Inventor： KROONEN ROGER JOHANNES MARIA HUBERTUS ,  CORNELISSEN SEBASTIAAN MARIA JOHANNES ,  DONDERS SJOERD NICOLAAS LAMBER ,  KATE NICOLAAS TEN ,  HAM RONALD VAN DER ,  ROSET NIEK JACOBUS JOHANNES ,  JACOBS FRANCISCUS MATHIJS ,  RIEPEN MICHEL ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS ,  ROOS REINDER WIETSE ,  HOGELAND MATTIJS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG126922A1

公开(公告)日：2006-11-29

申请号：SG200602941

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKER BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF DE ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS A ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA ,  TOORN VAN DER JAN-GERARD C ,  RIEPEN MICHEL

公开(公告)号：DE102006042987B4

公开(公告)日：2012-01-19

申请号：DE102006042987

申请日：2006-09-13

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： EHM DIRK HEINRICH DR ,  RUNSTRAAT ANNEMIEKE VAN DE DR ,  WOLSCHRIJN BASTIAAN THEODOOR DR ,  STORM ARNOLD DR ,  STEIN THOMAS DR ,  MEIJERINK MARCO G H ,  BASTEIN TON ,  SOEST-VERCAMMEN ESTHER L J VAN ,  KOSTER NORBERTUS BENEDICTUS ,  GUBBELS FRITS G H M ,  OPREL PETER J ,  NIENOORD MICHIEL ,  RIEPEN MICHEL ,  MOORS ROEL JOHANNES HUBERTUS JOSEPHINA DR

IPC: G03F7/20 ,  B08B7/00

Abstract: Verfahren zum Reinigen eines innerhalb einer Kammer angeordneten reflektiven optischen Elements für den weichen Röntgen- und extremen ultravioletten Wellenlängenbereich mit einer katalytischen Deckschicht mit den Schritten: – Aufheizen des reflektiven optischen Elements zumindest im Bereich der katalytischen Deckschicht auf 150°C und mehr; und – Zuleiten von molekularem Wasserstoff, zumindest in den Bereich der katalytischen Deckschicht, mit einem Partialdruck zwischen 0,01 mbar und 1 mbar.

公开(公告)号：SG176490A1

公开(公告)日：2011-12-29

申请号：SG2011084712

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  TIJMEN WILFRED MATHIJS GUNTHER ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.Fig. 12b

公开(公告)号：NL2006615A

公开(公告)日：2011-11-14

申请号：NL2006615

申请日：2011-04-18

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  RIEPEN MICHEL ,  CORNELISSEN ROB

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arranged such that, in use, liquid is provided on and removed from the undersurface of the fluid handling structure.

公开(公告)号：NL2006054A

公开(公告)日：2011-08-10

申请号：NL2006054

申请日：2011-01-24

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  ROPS CORNELIUS ,  VERDONCK ADRIANUS MARINUS ,  EUMMELEN ERIK ,  GRAAF SANDRA ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  KANEKO TAKESHI ,  DZIOMKINA NINA ,  BOKHOVEN LAURENTIUS ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID

IPC: G03F7/20

公开(公告)号：SG166747A1

公开(公告)日：2010-12-29

申请号：SG2010034312

申请日：2010-05-17

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS RUDOLF

Abstract: A fluid handling structure has a plurality of openings acting as a meniscus pinning system operating on the gas drag principle and a gas knife outwardly of the meniscus pinning system to break-up any film of liquid left behind. The separation between the gas knife and the meniscus pinning system is selected from the range of 1 mm to 5 mm. Desirably the underside of a barrier member in which the gas knife and the meniscus pinning system are provided is continuous, e.g. has no openings, between the gas knife and the meniscus pinning system. [Fig. 6]

公开(公告)号：NL2003226A

公开(公告)日：2010-03-09

申请号：NL2003226

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  ANTONEVICI ANCA ,  KATE NICOLAAS ,  OTTENS JOOST ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES

IPC: G03F7/20

公开(公告)号：SG157300A1

公开(公告)日：2009-12-29

申请号：SG2009031923

申请日：2009-05-08

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS RUDOLF ,  VERMEULEN JOHANNES PETRUS MART ,  DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN PUTTEN ARNOLD JAN

Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.