公开(公告)号：JP2006093703A

公开(公告)日：2006-04-06

申请号：JP2005270100

申请日：2005-09-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HOOGENDAM CHRISTIAAN A ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system continuously operating irrespective of changes in the scanning direction of a substrate by a projection system, while ensuring complete renewing of a liquid reservoir.
SOLUTION: In a scanning-type immersion lithography apparatus, an immersion liquid is supplied by one side of space between the projection system and the substrate, and is discharged at the other side so that the liquid flow is almost perpendicular to the scanning direction.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种连续运行的液体供应系统，而不管投影系统对基板的扫描方向的变化如何，同时确保液体储存器的完全更新。 解决方案：在扫描型浸没式光刻设备中，浸没液体由投影系统和基板之间的空间的一侧提供，并且在另一侧被排出，使得液体流几乎垂直于扫描 方向。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：WO2013113568A3

公开(公告)日：2013-12-12

申请号：PCT/EP2013050818

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/0081 ,  B23K26/342 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder (100) for a lithographic apparatus has a main body having a thin-film stack (110) provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls (106) to support a substrate (W) are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器（100）具有在其表面上设置有薄膜叠层（110）的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜堆叠或薄膜叠层的孔中形成有用于支撑基板（W）的多个毛刺（106）。

公开(公告)号：WO2013189827A2

公开(公告)日：2013-12-27

申请号：PCT/EP2013062259

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  LABETSKI DZMITRY ,  MESTROM WILBERT ,  KAMPINGA WIM RONALD ,  NIEUWENKAMP JAN OKKE ,  BRINKERT JACOB ,  CASTELIJNS HENRICUS ,  TEN KATE NICOLAAS ,  SCHIMMEL HENDRIKUS ,  JANSEN HANS ,  PAULUSSEN DENNIS ,  VIRGO BRIAN ,  JILISEN REINIER ,  BADIE RAMIN ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  VAN PUTTEN PETER ,  VAN DER STRAATEN GERRIT

IPC: G03F7/20

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：WO2014095266A3

公开(公告)日：2014-09-18

申请号：PCT/EP2013074742

申请日：2013-11-26

Applicant: ASML NETHERLANDS BV

Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70908

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450') disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

Abstract translation: 公开了一种用于将EUV辐射束投射到基板（400）的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块（420）和设置在衬底台周围的盖板（450'）。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元（430）位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。

公开(公告)号：SG171646A1

公开(公告)日：2011-06-29

申请号：SG2011031127

申请日：2006-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. [Figure No.1]

公开(公告)号：DE602005013175D1

公开(公告)日：2009-04-23

申请号：DE602005013175

申请日：2005-12-07

Applicant: ASML NETHERLANDS BV

Inventor： TEN KATE NICOLAAS

IPC: G03F7/20

Abstract: A reticle exchange unit for moving a reticle (MA) in a lithographic apparatus is disclosed. The surface of the reticle (MA) is protected by a pellicle attached thereto by a gas permeable pellicle frame. The reticle exchange unit includes a reticle preparation chamber (28), a reticle transport unit (26) arranged to cause a plurality of exposed gas permeable parts of the pellicle frame to face an interior of the reticle preparation chamber (28), and a purge gas pressure (282) and evacuating pressure supply (280) arrangement coupled to the reticle preparation chamber (28) and arranged to provide, alternately, a purge gas pressure and evacuating pressure that is lower than the purge gas pressure to the reticle preparation chamber (28) when the exposed gas permeable parts of the pellicle frame are facing the interior of the reticle preparation chamber (28), so that gas flows through the pellicle frame, alternately, into and out of a pellicle space between the pellicle and the reticle (MA).

公开(公告)号：DE602005003082T2

公开(公告)日：2008-08-14

申请号：DE602005003082

申请日：2005-09-07

Applicant: ASML NETHERLANDS BV

Inventor： HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

IPC: G03F7/20 ,  H01L21/027

Abstract: In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction.

公开(公告)号：DE602005020720D1

公开(公告)日：2010-06-02

申请号：DE602005020720

申请日：2005-08-05

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KEMPER NICOLAAS RUDOLF ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN DER TOORN JAN-GERARD CORNELIS ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BELFROID STEFAN PHILIP CHRISTIAAN ,  SMEULERS JOHANNES PETRUS MARIA ,  VOGEL HERMAN

IPC: G03F7/20

公开(公告)号：SG157342A1

公开(公告)日：2009-12-29

申请号：SG2009036385

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)- (iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.