公开(公告)号：SG137811A1

公开(公告)日：2007-12-28

申请号：SG2007036841

申请日：2007-05-21

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHEMUS JAC ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.

公开(公告)号：DE60030204T2

公开(公告)日：2007-07-12

申请号：DE60030204

申请日：2000-06-01

Applicant: ASML NETHERLANDS BV

Inventor： VAN EMPEL TJARKO ADRIAAN RUDOL ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A lithographic projection apparatus includes, a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, wherein the substrate holder has a supporting face for supporting a substrate and the supporting face is at least partially coated with a layer of electrically conductive material.

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2004907A

公开(公告)日：2010-12-20

申请号：NL2004907

申请日：2010-06-17

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  JANSEN HANS ,  BRUIJSTENS JEROEN ,  THOMAS IVO ,  KUSTERS GERARDUS ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：SG155256A1

公开(公告)日：2009-09-30

申请号：SG2009057522

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRIKUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIJPER ANTHONIE

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base,that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

公开(公告)号：NL1036009A1

公开(公告)日：2009-04-07

申请号：NL1036009

申请日：2008-10-02

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JANSEN HANS

IPC: G03F7/20

公开(公告)号：SG148971A1

公开(公告)日：2009-01-29

申请号：SG2008048233

申请日：2008-06-25

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

Abstract: Substrates and Methods of Using Those Substrates A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.

公开(公告)号：DE602006000372T2

公开(公告)日：2009-01-02

申请号：DE602006000372

申请日：2006-02-13

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

IPC: G03F7/20

公开(公告)号：DE602005000696T2

公开(公告)日：2008-01-24

申请号：DE602005000696

申请日：2005-04-04

Applicant: ASML NETHERLANDS BV

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS ,  DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES ,  MULKENS JOHANNES CATHARINUS ,  PEETERS FELIX GODFRIED ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG132647A1

公开(公告)日：2007-06-28

申请号：SG2006081707

申请日：2006-11-23

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS HERNES ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.