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11.发明申请PASSIVE RETICLE TOOL, LITHOGRAPHIC APPARATUS AND METHOD OF PATTERNING A DEVICE 审中-公开被动版本工具，平面设备和设计方法
公开(公告)号：WO2006133907A8
公开(公告)日：2008-04-17
申请号：PCT/EP2006005684
申请日：2006-06-13
Applicant: ASML NETHERLANDS BV , VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
Inventor： VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
IPC: G03F7/20
CPC classification number: G01J4/04 , G03F7/70091 , G03F7/70566 , G03F7/70591 , G03F7/70716
Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：SG136068A1
公开(公告)日：2007-10-29
申请号：SG2007017858
申请日：2007-03-09
Applicant: ASML NETHERLANDS BV
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公开(公告)号：DE602005012916D1
公开(公告)日：2009-04-09
申请号：DE602005012916
申请日：2005-12-05
Applicant: ASML NETHERLANDS BV
IPC: G03F7/20
Abstract: An analyser plate (AP) between a projection system (PL) and a radiation sensor (DS) is illuminated by a beam of projection radiation. The analyser plate contains 2 crossing regions, each of which transmits radiation with a different polarisation direction. The beam of projection radiation is patterned without influencing the polarisation of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor (DS) is given polarisation selectivity.
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公开(公告)号：DE602006000357T2
公开(公告)日：2008-12-11
申请号：DE602006000357
申请日：2006-02-17
Applicant: ASML NETHERLANDS BV
Inventor： KOK HAICO VICTOR , VAN DE KERKHOF MARCUS ADRIANUS , KRUIZINGA BORGERT , SENGERS TIMOTHEUS FRANCISCUS , MOEST BEARRACH , HAAST MARC ANTONIUS MARIA , WEISSBRODT PETER WERNER , SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANN , HARZENDORF TORSTEN
IPC: G03F7/20
Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
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Patent Agency Ranking
公开(公告)号：SG152931A1
公开(公告)日：2009-06-29
申请号：SG2007177637
申请日：2004-06-08
Applicant: ASML NETHERLANDS BV
Inventor： LOF JOERI , BUTLER HANS , DONDERS SJOERD NOCOLAAS LAMBERTUS , KOLESNYCHENKO ALLEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA MARIA
IPC: G03F7/20 , H01L21/027
Abstract: A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.
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公开(公告)号：DE602006000357D1
公开(公告)日：2008-02-07
申请号：DE602006000357
申请日：2006-02-17
Applicant: ASML NETHERLANDS BV
Inventor： KOK HAICO VICTOR , VAN DE KERKHOF MARCUS ADRIANUS , KRUIZINGA BORGERT , SENGERS TIMOTHEUS FRANCISCUS , MOEST BEARRACH , HAAST MARC ANTONIUS MARIA , WEISSBRODT PETER WERNER , SCHRENK MANFRED HELMUT GUSTAV , HARZENDORF TORSTEN
IPC: G03F7/20
Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
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公开(公告)号：CA3149349A1
公开(公告)日：2021-03-04
申请号：CA3149349
申请日：2020-08-20
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BALTUSSEN SANDER , BANINE VADIM YEVGENYEVICH , DOLGOV ALEXANDR , DONMEZ NOYAN INCI , HOUWELING ZOMER SILVESTER , NOTENBOOM ARNOUD WILLEM , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER WOORD TIES WOUTER , VERMEULEN PAUL ALEXANDER , VLES DAVID FERDINAND , VORONINA VICTORIA , YEGEN HALIL GOKAY
IPC: G03F1/62 , C01B32/158 , D01F9/12 , D01F11/12 , G03F7/20
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：CA3008474A1
公开(公告)日：2017-06-22
申请号：CA3008474
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , DE GRAAF DENNIS , JANSSEN PAUL , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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