公开(公告)号：NL1036211A1

公开(公告)日：2009-06-04

申请号：NL1036211

申请日：2008-11-18

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  KATE NICOLAAS TEN ,  STEVENS LUCAS HENRICUS JOHANNES ,  HAM RONALD VAN DER ,  RIEPEN MICHEL

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG132647A1

公开(公告)日：2007-06-28

申请号：SG2006081707

申请日：2006-11-23

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  DONDERS SJOERD NICOLAAS LAMBER ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS HERNES ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：NL2010965A

公开(公告)日：2013-12-24

申请号：NL2010965

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  JANSEN HANS ,  KATE NICOLAAS ,  PAULUSSEN DENNIS ,  SCHIMMEL HENDRIKUS ,  LABETSKI DZMITRY ,  CASTELIJNS HENRICUS ,  MESTROM WILBERT ,  BADIE RAMIN ,  KAMPINGA WIM ,  NIEUWENKAMP JAN ,  BRINKERT JACOB ,  VIRGO BRAIN ,  JILISEN REINIER ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  PUTTEN PETER ,  STRAATEN GERRIT

IPC: H01L21/02

公开(公告)号：NL2010108A

公开(公告)日：2013-07-22

申请号：NL2010108

申请日：2013-01-10

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  MOORS ROEL ,  SCHOOT JAN ,  VERHAGEN MARTINUS ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  RIEPEN MICHEL ,  SCHIMMEL HENDRIKUS ,  MEDVEDEV VIACHESLAV

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009472A

公开(公告)日：2013-04-25

申请号：NL2009472

申请日：2012-09-17

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：AT548679T

公开(公告)日：2012-03-15

申请号：AT09159532

申请日：2009-05-06

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  VERMEULEN JOHANNES ,  DIRECKS DANIEL ,  PHILIPS DANNY ,  VAN PUTTEN ARNOLD

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL2005974A

公开(公告)日：2011-08-15

申请号：NL2005974

申请日：2011-01-10

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS

IPC: G03F7/20

Abstract: A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm.

公开(公告)号：NL2003933A

公开(公告)日：2010-06-14

申请号：NL2003933

申请日：2009-12-10

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  BALLEGOIJ ROBERTUS ,  VERMEULEN MARCUS ,  BERKVENS PAUL ,  METSENAERE CHRISTOPHE ,  ROPS CORNELIUS ,  RIEPEN MICHEL ,  HEUVEL MARTINUS ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2003225A1

公开(公告)日：2010-01-26

申请号：NL2003225

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  DONDERS SJOERD ,  KEMPER NICOLAAS ,  PHILIPS DANNY ,  RIEPEN MICHEL ,  DUNGEN CLEMENS VAN DEN ,  BAETEN ADRIANES ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：SG157342A1

公开(公告)日：2009-12-29

申请号：SG2009036385

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)- (iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.